Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-27T16:59:51.054Z Has data issue: false hasContentIssue false

Growth of High Quality Single Crystal ZnO Films on Sapphire by Pulsed Laser Ablation

Published online by Cambridge University Press:  15 February 2011

A.K. Sharma
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916.
K. Dovidenko
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916.
S. Oktyabrsky
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916.
D.E. Moxey
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916.
J.F. Muth
Affiliation:
Department of Electrical Engineering, North Carolina State University, Raleigh, NC 27695.
R.M. Kolbas
Affiliation:
Department of Electrical Engineering, North Carolina State University, Raleigh, NC 27695.
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916.
Get access

Abstract

The structural and optical characterizations of single crystal zinc oxide films on sapphire have been performed. The ZnO films were deposited by pulsed laser deposition in an oxygen environment. These films were annealed in oxygen for further improvement in the oxygen stoichiometry. Both as-deposited and oxygen annealed films were high quality single crystal as characterized by X-ray diffraction and transmission electron microscopy. The defect density, comprised mainly of dislocations and stacking faults, was low as compared to high quality films of III-nitrides deposited on sapphire. Under these growth conditions, the ZnO films grow two dimensionally on sapphire as opposed to GaN which grows three dimensionally. The band edge photoluminescence was found to be dominant, and an order of magnitude higher in the annealed films. Transmission measurements and the electrical resistivity of the annealed films also show the films were of high quality after annealing. It is envisaged that these improvements in the quality of the ZnO films occur as a result of reduction of oxygen vacancies and the density of point defects.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hasse, M.A., Qui, J., Depuydt, J.M., and Cheng, H., Appl. Phys. Lett., 59, 1272 (1991).Google Scholar
2. Nakamura, S., Senoh, M., Nagahama, A., Iwasa, N., Namada, T., Matsushita, T., Sugimoto, Y., and Kiyoku, H., Appl. Phys. Lett., 69, 1477 (1996).Google Scholar
3. Reynolds, D.C., Look, D.C., Jogai, B., and Morkoc, H., Solid State Commun., 101, 643 (1997).Google Scholar
4. Hamdani, F. et al. , Appl. Phys. Lett., 70, 467 (1997).Google Scholar
5. Hamdani, F., Botchkarev, A.E., Tang, H., Kim, W., and Morkoc, H., Appl. Phys. Lett., 71, 3111 (1997).Google Scholar
6. Muth, J.F., Lee, J.H., Shmagin, I.K., Kolbas, R.M., Casey, H.C. Jr., Keller, B.P., Mishra, U.K., and Denbaars, S.P., Appl. Phys. Lett., 71, 2572 (1997).Google Scholar
7. Reynolds, D.C., Look, D.C., and Jogai, B., Solid State Commun., 99, 873 (1996).Google Scholar
8. Johnston, W.D. Jr., J. Appl. Phys., 42, 2731 (1971).Google Scholar
9. Bagnall, D.M., Chen, Y.F., Zhu, Z., Yao, T., Koyama, S., Shen, M.Y., and Goto, T., Appl. Phys. Lett., 70, 2230 (1997).Google Scholar
10. Narayan, J., Dovidenko, K., Sharma, A.K., and Oktyabrsky, S., J. Appl. Phys. (Submitted, 1998).Google Scholar
11. Muth, J.F., Lee, J.H., Kolbas, R.M., Sharma, A.K., Oktyabrsky, S., and Narayan, J., Appl. Phys. Lett. (to be submitted).Google Scholar
12. Van De Pol, Frans C.M., Ceramic Bulletin, 69, 1959 (1990).Google Scholar
13. Vanheusden, K., Seager, C.H., Warren, W.L., Tallant, D.R., and Voigt, J.A., Appl. Phys. Lett., 68, 403 (1996).Google Scholar
14. Dovidenko, K., Oktyabrsky, S., Sharma, A.K., and Narayan, J., MRS Symp. Proc., (Advances in Laser Ablation of Materials), 1998.Google Scholar