Hostname: page-component-7bb8b95d7b-2h6rp Total loading time: 0 Render date: 2024-09-15T22:37:51.037Z Has data issue: false hasContentIssue false

Growth of Bulk, Polycrystalline Gallium and Indium Nitride at Sub-Atmospheric Pressures

Published online by Cambridge University Press:  10 February 2011

John C. Angus
Affiliation:
Chemical Engineering Dept., Case Western Reserve University, Cleveland, OH 44106
Alberto Argoitia
Affiliation:
Chemical Engineering Dept., Case Western Reserve University, Cleveland, OH 44106
Cliff C. Hayman
Affiliation:
Chemical Engineering Dept., Case Western Reserve University, Cleveland, OH 44106
Long Wang
Affiliation:
Materials Science and Engineering Dept., Case Western Reserve University, Cleveland, OH 44106
Jeffrey S. Dyck
Affiliation:
Physics Dept., Case Western Reserve University, Cleveland, OH 44106
Kathleen Kash
Affiliation:
Physics Dept., Case Western Reserve University, Cleveland, OH 44106
Get access

Abstract

Bulk, polycrystalline gallium nitride and indium nitride were crystallized at sub-atmospheric pressures by saturating the pure metals with nitrogen from a microwave electron cyclotron resonance source. Saturation of Ga/In melts with nitrogen led only to the crystallization of gallium nitride. The polycrystalline samples were wurtzitic. The gallium nitride was well faceted, with narrow Raman lineshapes, and showed near-band-edge and yellow band photo-luminescence at both 4K and 300K. The indium nitride was formed in smaller amounts, was less well faceted, and showed no photoluminescence.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Edgar, J.H., Editor, Properties of Group HI Nitrides. EMIS Datareviews Series, No. 11, IN SPEC, (Institution of Electrical Engineers, London, UK, 1994).Google Scholar
2. Karpinski, J. and Porowski, S., J. Crystal Growth 66, 11 (1984)Google Scholar
3. Porowski, S., Jun, J., Perlin, P., Grzegory, I., Teisseyre, H. and Suski, T., Inst. Phys. Conf. Series, No. 137, Chapter 4, (5th Conf. on SiC and Related Materials, Washington, DC, 1993) p. 369.Google Scholar
4. Perlin, P., Gorszyca, I., Christensen, N. E., Grzegory, I., Teisseyre, H., and Suski, T., Phys. Rev. B 45, p. 13, 307 (1992).Google Scholar
5. Argoitia, A., Hayman, C.C., Angus, J.C., Wang, L., Dyck, J.S., and Kash, K., Appl. phys. Lett., 70, 179(1997)Google Scholar
6. Argoitia, A., Hayman, C.C., Angus, J.C., Wang, L., Dyck, J.S., and Kash, K., Proceedings III-V Nitride Symposium, Materials Research Society Meeting, Boston, MA, December 1996.Google Scholar
7. Newman, N. in III-V Nitride Materials and Processes, edited by Moustakas, T.D., Dismukes, J.P., and Pearton, S.J., Proceedings Volume 96–11, (Electrochemical Society, Pennington, NJ, 1996) p. 119 Google Scholar
8. McNeil, L. E., Properties of Group HI Nitrides, edited by Edgar, J.H., EMIS Datareviews Series, No. 11, INSPEC, (Institution of Electrical Engineers, London, UK, 1994) p. 254 Google Scholar
9. Porowski, S. and Grzegory, I., Properties of Group III Nitrides, edited by Edgar, J.H., EMIS Datareviews Series, No. 11, INSPEC, (Institution of Electrical Engineers, London, UK, 1994) p. 7175.Google Scholar