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Growth Kinetics and Corresponding Luminescence Characteristics of Amorphous C:H Deposited from Ch4 by Dc Saddle-Field Plasma-Assisted Cvd

Published online by Cambridge University Press:  22 February 2011

Roman V. Kruzelecky ,
Chun Wang  and
Stefan Zukotynski
Roman V. Kruzelecky
Affiliation:
University of Toronto, Department of Electrical and Computer Engineering, Toronto, Ontario, Canada, M5S 1A4
Chun Wang
Affiliation:
University of Toronto, Department of Electrical and Computer Engineering, Toronto, Ontario, Canada, M5S 1A4
Stefan Zukotynski
Affiliation:
University of Toronto, Department of Electrical and Computer Engineering, Toronto, Ontario, Canada, M5S 1A4
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Abstract

Hydrogenated amorphous carbon (a-C:H) thin films were deposited onto various substrates at 200 °C by DC saddle-field glow-discharge dissociation of CH4. In situ plasma probe mass and energy spectroscopy was employed to systematically study the effects of the discharge parameters on the formation of reactive precursors. The ion current at the substrate holder consists mainly of CH3+ for pressures < 75 mTorr; higher pressures and lower discharge currents encourage the formation of C2Hn+ and C3Hn+ radicals in the discharge. The growth rate was largely independent of the total pressure, increasing approximately linearly with the discharge current. Under 476 nm photo-excitation, the a-C:H films exhibited room-temperature photoluminescence in the visible, near 1.9 eV, with an intensity that was strongly dependant on the discharge parameters.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 537
Copyright
Copyright © Materials Research Society 1994

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References

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