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Growth and Microstructure of SrBi2Ta2O9 thin films

Published online by Cambridge University Press:  10 February 2011

S. Srinivas
Affiliation:
Physics Department, University of Puerto Rico, San Juan, PR 00931–3343
Ram S. Katiyar
Affiliation:
Physics Department, University of Puerto Rico, San Juan, PR 00931–3343
Won-Jeong Kim
Affiliation:
Surface modification branch, Code 6670, Naval Research Laboratories, Washington DC 20375.
Steven W. Kircohefer
Affiliation:
Surface modification branch, Code 6670, Naval Research Laboratories, Washington DC 20375.
James S. Horwitz
Affiliation:
Surface modification branch, Code 6670, Naval Research Laboratories, Washington DC 20375.
Douglas B. Chrisey
Affiliation:
Surface modification branch, Code 6670, Naval Research Laboratories, Washington DC 20375.
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Abstract

Single phase, (001) oriented SrBi2Ta2O9(SBT) thin films have been deposited on (100) MgO substrates using pulsed laser deposition(PLD) technique. In order to study the influence of the growth conditions on the microstructure and stoichiometry, SBT film growth was carried out under different deposition conditions, using an Kr:F excimer laser (248 nm, 30 ns FWHM). Effect of laser fluence(0.75–2 J/cm2), frequency of the laser pulse (4–10 Hz), substrate temperature (700–850°C), oxygen partial pressure(150–450 mTorr) have been studied using X-ray diff-raction(XRD), Scanning Electron Microscope(SEM), X-ray energy dispersive analysis (EDAX), atomic force microscopy(AFM). It was found that small variation in growth temperature and oxygen pressure has a large influence on the average grain size (50–180 nm) and surface roughness (0.14–0.3 nm) respectively. Outgrowths on the film surface were observed at high substrate temperatures, high laser energy and with higher frequencies (>6) of the laser pulse. Highly c-axis oriented SBT thin films with homogeneous surface morphology and with an average surface roughness of 0.14 nm were deposited at 750 °C, 260 mTorr O2 pressure and 1.25 J/cm2 laser fluence. These films have a tangent loss around 0.05 and dielectric constant around 417 with a tunability of 4% in the microwave frequency region (1–20 GHz).

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

1. Araujo, C.A Paz De, Cuchlaro, J.D., Mcmillan, L.D., Scott, M.C. and Scott, J.F., Nature 374, 627, (1995)10.1038/374627a0Google Scholar
2. Araujo, C.A Paz de, Cuchiaro, J.D., Scott, M.C., and McMillan, L.D., International patent publication No W093/12542, 24 June 1993.Google Scholar
3. Desu, S.B. and Vijay, D.P., Mater. Sci. Engg B 32, 75 (1995)10.1016/0921-5107(95)80017-4Google Scholar
4. Dat, R, Auciello, J. K. Lee O., and Kingon, A. I., Appl. Phys. Lett 67,572, (1995)10.1063/1.115173Google Scholar
5. Desu, S.B. and Vijay, D.P., Mater. Sci. Engg B 34, L4 (1995)10.1016/0921-5107(95)01232-XGoogle Scholar
6. Amanuma, K., Hase, T. and Miyasaka, Y., Appl. Phy. Lett., 66, 221(1995).10.1063/1.113140Google Scholar
7. Li, T., Zhu, Y., Desu, S.B., Peng, C.H. and Nagata, M.. Appl. Phys. Lett 67, 572 (1995)Google Scholar
8. Song, T.K., J.K Lee, and Jung, H. J., Appl. Phys. Lett 69, 3839 (1996)10.1063/1.117122Google Scholar
9. Wante Chang, James Horwitz, S., Carter, Adriaan C., Pond, Jeffrey M., Kirchoefer, Steven W., Gilmore, Charles M., Chrisey, Douglas B., Appl. Phys. Lett., 74, 1033, (1999)Google Scholar
10. Desu, S.B., Cho, H.S., and Nagata, M., Phys. Stat. Sol. 165, 213 (1998)10.1002/(SICI)1521-396X(199801)165:1<213::AID-PSSA213>3.0.CO;2-H3.0.CO;2-H>Google Scholar
11. Desu, S.B., Vijay, D.P., Zhang, X., and He, B.P., Appl. Phys. Lett. 69,1719 (1996)10.1063/1.118008Google Scholar