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The Growth and Characterization of Zinc Oxide Thin Film on Fused Silica and SiO2/Si(100) Substrates

Published online by Cambridge University Press:  11 February 2011

C. Jin ,
A. Tiwari ,
H. Porter ,
M. Park  and
J. Narayan
C. Jin
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695–7916
A. Tiwari
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695–7916
H. Porter
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695–7916
M. Park
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695–7916
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, 27695–7916
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Abstratct

In this work, ZnO thin films were grown on amorphous fused silica and pre-oxidized silicon substrates by using pulsed laser deposition technique. X-ray diffraction patterns showed that the films were highly crystalline and c-axis oriented. The surface morphologies of the films were observed by using scanning electron microscope and optical microscope. Free exciton absorption was observed at room temperature for the film grown on fused silica substrate. The strong near-UV luminescence peaked at 380 nm were observed for all the films and was attributed to the phonon-related exciton emission. The effect of oxygen partial pressure on the luminescence intensity is also reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 744: Symposium M – Progress in Semiconductors II–Electronic and Optoelectronic Applications , 2002 , M5.6
Copyright
Copyright © Materials Research Society 2003

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References

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