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Growth and characterization of epitaxial films of ZnGeP2.

Published online by Cambridge University Press:  11 February 2011

G.A. Verozubova ,
A. I. Gribenyukov ,
M.C. Ohmer ,
N.C. Fernelius  and
J.T. Goldstein
G.A. Verozubova
Affiliation:
Institute of Optical Monitoring SB RAS, 10/3 Akademicheskii Tomsk, 634055, Russia
A. I. Gribenyukov
Affiliation:
Institute of Optical Monitoring SB RAS, 10/3 Akademicheskii Tomsk, 634055, Russia
M.C. Ohmer
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPSO, Wright-Patterson Air Force Base, Dayton, OH, USA
N.C. Fernelius
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPSO, Wright-Patterson Air Force Base, Dayton, OH, USA
J.T. Goldstein
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPSO, Wright-Patterson Air Force Base, Dayton, OH, USA
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Abstract

Thermodynamic analysis of the vapor phase over ZnGeP2 in Zn-Ge-P-Cl system has been carried out. The analysis showed that this system can be used for the vapor growth of ZnGeP2. Homoepitaxial layers of ZnGeP2 were grown in a closed system using chemical vapor transport. Electrical and photoluminescence properties of the layers were studied, and crystal lattice parameters were measured. Comparison of properties for bulk and vapor grown ZnGeP2 crystals were carried out. It was found that the vapor grown crystals have more perfect structure than the bulk ones, particularly, they have significantly lower vacancy concentration.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 744: Symposium M – Progress in Semiconductors II–Electronic and Optoelectronic Applications , 2002 , M8.46
Copyright
Copyright © Materials Research Society 2003

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References

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