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Graphitic Schottky Contacts to Si formed by Energetic Deposition

Published online by Cambridge University Press:  07 October 2015

Mohammad Saleh N Alnassar ,
Patrick W. Leech ,
Geoff K. Reeves ,
Anthony S. Holland ,
Desmond W. M. Lau ,
Dougal G. McCulloch ,
Hiep N. Tran  and
Jim G. Partridge
Mohammad Saleh N Alnassar
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Patrick W. Leech
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Geoff K. Reeves
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Anthony S. Holland
Affiliation:
School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Desmond W. M. Lau
Affiliation:
School of Applied Sciences, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Dougal G. McCulloch
Affiliation:
School of Applied Sciences, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
Hiep N. Tran
Affiliation:
Centre of Technology, RMIT University, Hồ Chí Minh City, Vietnam.
Jim G. Partridge
Affiliation:
School of Applied Sciences, RMIT University, GPO Box 2476V, Melbourne VIC 3001, Australia
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Abstract

Carbon films deposited by filtered cathodic vacuum arc have been used to form high quality Schottky diodes on p-Si. Energetic deposition with an applied substrate bias of -1 kV and with a substrate temperature of 100 °C has produced carbon diodes with rectification ratios of ∼ 3 × 106, saturation currents of ∼0.02 nA and ideality factors close to unity (n = 1.05). Simulations were used to estimate the effective work function and the thickness of an interfacial mixed (C/SiO2) layer from the current/voltage characteristics of the diodes.

Keywords

CSielectrical properties
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1786: Symposium T – Graphene and Carbon Nanotubes , 2015 , pp. 51 - 56
Copyright
Copyright © Materials Research Society 2015 

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References

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