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Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation

Published online by Cambridge University Press:  10 February 2011

B. L. Sopori ,
W. Chen ,
J. Alleman ,
R. Matson ,
N. M. Ravindra  and
T. Y. Tan
B. L. Sopori
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
W. Chen
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
J. Alleman
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
R. Matson
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401
N. M. Ravindra
Affiliation:
Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102
T. Y. Tan
Affiliation:
Mechanical Engineering Department, Duke University, Durham, NC 27708.
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Abstract

A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 485: Symposium G – Thin Film Structures for Photovoltaics , 1997 , 95
Copyright
Copyright © Materials Research Society 1998

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