Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-29T08:00:09.688Z Has data issue: false hasContentIssue false
  • English
  • Français

Glancing Incidence X-Ray Diffraction of Polycrystalline Thin Films

Published online by Cambridge University Press:  01 February 2011

Brian E. McCandless
Brian E. McCandless*
Affiliation:
Institute of Energy Conversion University of Delaware, Newark, DE 19716
Get access

Abstract

Glancing incidence x-ray diffraction (GIXRD) is a powerful diagnostic tool for nondestructive analysis of thin film materials and structures. GIXRD fundamentals and experimental techniques and results are presented with respect to polycrystalline thin-films. The refraction index and critical incident beam angle are calculated for selected elemental and inorganic compounds. Quantitative GIXRD analysis with Cu Kα radiation is applied to several problems: recrystallization of ultra-thin chemical surface deposited CdS films; compositional grading in CuIn1-xGaxSe2 films; formation of native oxides on CdTe films; interdiffusion between CdTe and CdS; Te film thickness determination on etched CdTe; and correlation of inplane residual stress with deposition conditions for sputtered Mo films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 865: Symposium F – Thin-Film Compound Semiconductor Photovoltaics , 2005 , F4.1
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Klug, H. P. and Alexander, L. E., X-ray Diffraction Procedures (1974) J. Wiley and Sons, New York.Google Scholar
2 International Tables for X-Ray Crystallography, Vol. III. (1962).Google Scholar
3 James, R. W., The Optical Principles of the Diffraction of X-Rays (1962) Oxbow Press, Connecticut.Google Scholar
4See treatments of Scherrer and Stokes and Wilson in: Warren, B. E., X-Ray Diffraction (1968) Dover, New York.Google Scholar
5 Gavini, A. and Cardona, M., Phys. Rev. B1 (1970) 672–678.Google Scholar
6 Battiston, G. A. and Gerbasi, R., Thin Film Characterization by Advanced X-Ray Diffraction Techniques (1996) Laboratori Nazionali Di Frascati, 225–243.Google Scholar
7 McCandless, B. E. and Shafarman, W. N., Conf. Rec. WCPEC-3 (2003).Google Scholar
8 Marudachalam, M., Hichri, H., Klenk, R., Birkmire, R. W., Shafarman, W. N., Schultz, J. M., Appl. Phys. Lett. 67 (1995) 3978–3982.Google Scholar
9 McCandless, B. E., Buchanan, W. A., Birkmire, R. W., Conf. Rec. 21st IEEE PVSC (2005).Google Scholar
10 McCandless, B. E. and Sites, J. R., Chapter 14 in: Luque, A. and Hegedus, S., Ed., Handbook of Photovoltaic Science and Engineering (2003), J. Wiley and Sons, Chichester, 617–662.Google Scholar