Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-29T07:36:36.313Z Has data issue: false hasContentIssue false

Giant Magnetoresistance and Soft Magnetic Properties of NiFeCo/Cu Multilayers

Published online by Cambridge University Press:  03 September 2012

S. Tsunashima
Affiliation:
Nagoya University, Nagoya, 464–01, Japan.
M. Jimbo
Affiliation:
Daido Institute of Technology, Nagoya, 457, Japan.
T. Kanda
Affiliation:
Nagoya University, Nagoya, 464–01, Japan.
S. Goto
Affiliation:
Nagoya University, Nagoya, 464–01, Japan.
S. Uchiyama
Affiliation:
Nagoya University, Nagoya, 464–01, Japan.
Get access

Abstract

Giant Magnetoresistance (GMR) and soft magnetic properties together with their structural characteristics were investigated for Ni66Fe16Co18/Cu Multilayers. The Multilayers were prepared by the conventional rf sputtering method on glass or Si substrates using various buffer layers including Fe, NiFeCo, NiFe and CoZr. Although Most of the multilayers exhibited (111) preferred orientation, Fe buffered multilayers showed a considerable (200) X-ray diffraction peak at Cu thicknesses around 1 nm and 2.2 nm which corresponded to the peak positions of GMR. By using fee or amorphous underlayers the (200) diffraction intensity decreased while antiferromagnetic coupling strength was much reduced. Cross-sectional transmission electron micrograph revealed that the (100) oriented multilayer was grown on the (100) oriented Fe underlayer. By controlling the crystal orientation and the layer structure, significantly large magnetoresistance ratio of more than 10 % can be achieved in a field as low as 30 Oe.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Shinjo, T. and Yamamoto, H., J. Phys. Soc. Jpn, 59, 3061 (1990)Google Scholar
[2] Sakakima, H. and Satomi, M., Jpn J. Appl. Phys. 31, L484 (1992)Google Scholar
[3] Dieny, B., Speriou, V.S., Parkin, S.S.P., Gurney, B.A., Wilhoit, D. R. and Mauri, D., Phys. Rev. B, 43, 1297 (1991)Google Scholar
[4] Parkin, S.S.P., Appl. Phys. Lett. 60, 27 (1992)Google Scholar
[5] Nakatani, R., Dei, T., Kobayashi, T. and Sugita, Y., IEEE Trans. Magn. 28, 2668 (1992)Google Scholar
[6] Jimbo, M., Kanda, T., Goto, S., Tsunashima, S. and Uchiyama, S., Jpn. J. Appl. Phys., 31, L1348(1992)Google Scholar
[7] Tsunashima, S., Jimbo, M., Kanda, T., Goto, S. and Uchiyama, S., J. Magn. Magn. Mater. (in press)Google Scholar
[8] Kanda, T., Jimbo, M., Goto, S., Kumazawa, K. and Uchiyama, S., J. Mag. Soc. Jpn. 17 (in press)Google Scholar
[9] Jimbo, M., Kanda, T., Goto, S., Tsunashima, S. and Uchiyama, S., Proc. the first Intnat. Symp. on metallic multilayers, Kyoto, 1993 (to be published in J. Magn. Magn. Mater.)Google Scholar
[10] McKeehan, L.W., Phys. Rev. 51, 136 (1937)Google Scholar
[11] Tolman, C.H., J. Appl. Phys. 38, 3409 (1967)Google Scholar
[12] Fujii, T., Uchiyama, S., Takayasu, M., and Takahashi, K., MéMoire of Faculty of Engng. Nagoya Univ., 26, 109 (1974)Google Scholar
[13] Egelhoff, W.F. Jr and Kief, M.T., Phys. Rev. B, 45, 7795 (1992)Google Scholar
[14] Kamijo, J.A. and Igarashi, H., Jpn J. Appl. Phys. 31, L1058 (1992)Google Scholar
[15] Renard, J.P., Beauvillain, P., Dupas, G, Dang, K. Le., Veillet, P., Vlu, E., Marlire, C. and Renard, D., J. Magn. Magn. Mater., 115, L147 (1992)Google Scholar