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Gas Phase Reactions Relevant to Chemical Vapor Deposition: Optical Diagnostics

Published online by Cambridge University Press:  21 February 2011

D. Burgess Jr
D. Burgess Jr*
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

Laser photolysis, optical emission, and laser-induced fluorescence (LIF) were used to investigate laser driven decomposition processes in the gas phase pertaining to the systems: SiH4 → Si (s) and SiH4 → NH3 → Si3N4 (s). These processes are important to silicon/ silicon-nitride chemical vapor deposition, flame-driven gas phase silicon-particle nucleation, and laser-induced processes for materials fabrication. UV laser photolysis was used to generate SiHx and NHx species from silane and ammonia. A number of photofragments were identified by emission from excited states. The rate of reaction of NH2 with silane was measured using LIF to detect NH2 as a function of time following photolysis of ammonia

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 137
Copyright
Copyright © Materials Research Society 1990

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