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From Proposal To Product: Scaling Up The Chemical Synthesis of MOCVD Oxide Precursors

Published online by Cambridge University Press:  10 February 2011

T J Leedham
T J Leedham*
Affiliation:
Inorgtech Ltd, Mildenhall, Suffolk, UK
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Abstract

An essential step in the commercialisation of the MOCVD technique is the prompt availability of reliable precursors such as volatile alkoxides and diketonates for oxide deposition. Synthesis methods must be scaled by three orders of magnitude from grams to kilos to manufacture precursors for commercial devices. Impurities determine whether an identified method is viable due to the way in which they affect yield, shelf life and performance. Deleterious contaminants include free radicals, moisture damage and raw material remnants. Such considerations dominate multi-kilo synthesis but their impact may not have been perceived at an earlier stage. By particular examples we show attention to methodology can overcome these problems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 415: Symposium BB – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II , 1995 , 79
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1. Parham, T. G., Desu, S. B. and Tschetter, C. D., U.S. Pat. 4,949,005 (1990)Google Scholar
2. Hitchens, W. R., Krusell, W. C. and Dobkin, D. M., J. Electrochem. Soc. 140(9) 2615–21 (1993)Google Scholar
3. Demiryont, H., S.P.I.E. 1536 Optical Materials Technology for Energy Efficient and Solar Energy Conversion X (1991)Google Scholar
4. Fujii, E., Torii, H., Takayama, R. and Hirao, T., Jpn. J. Appl. Phys. 34 130–1 (1995)Google Scholar
5(a). Lu, K., Hiskes, R., DeCarolis, S. A., Route, R. K., Feigelson, R. S., Leplingard, F. and Fouquet, J. E., J. Mater. Res. 9(9) 2258–63 (1994)Google Scholar
5(b). Shimizu, M., Sugiyama, M., Fujusawa, H. and Shiosaki, T., Integr. Ferroelectr. 6(3) 155–164 (1995)Google Scholar
5(c). McMillan, L. D., Integr Ferroelectr. 5(2) 97–102 (1994)Google Scholar
6. Haanappel, V.A.C., Corbach, H. D. van, Fransen, T. and Gellings, P. J., High Temp. Mater. Process. 13(2) 149–158 (1994)Google Scholar
7. Pola, J., Fajgar, R., Bastl, Z. and Diaz, L., J Mater. Chem. 2(9) 961–4 (1992)Google Scholar
8(a). Carolan, M. F., Dyer, P. N., Fine, S. M., Makitka, A., Richards, R. E. and Schaffer, L. E., U.S. Pat. 5,332,597 (1994)Google Scholar
8(b). Moon, S. K., Kim, H. J., Kim, M. H. and Sohn, Y. S., Hwahak Konghak 30(1) 1–8 (1992), Chem. Abs. 117 77483Google Scholar
9. Miller, J. B., Bernasek, S. L. and Schwartz, J., J.A.C.S. 117(14) 4037–41 (1995)Google Scholar
10. Dieten, V.E.J. Van, Dekker, J. P., Schoonman, J., M.R.S. Symp. Proc. 369 669–681 (1995)Google Scholar
11(a). Barron, A. R. and Rees, W. S., Adv. Mater. Opt. and Electr. 2 271–288 (1993)Google Scholar
11(b) Dahmen, K. H. and Gerfin, T., Prog. Cryst. Growth and Charact. 27 117–161 (1993)Google Scholar
12. Houlton, D. J., Jones, A. C., Haycock, P. W., Williams, E. W., Bull, J. and Critchlow, G. W., Chem. Vap. Dep. 1(1) 26–28 (1995)Google Scholar
13. Bradley, D. C., Wardlaw, W. and Whitley, A., J.C.S. 1955 726–8 and 1956 1139–42Google Scholar
14. Kapoor, P. N. and Mehrotra, R. C., J Less Common Metals 8 339 (1965)Google Scholar
15. Shamlian, S. H., Hitchman, M. L., Cook, S. L. and Richards, B. C., J. Mater. Chem. 4(1) 81–85 (1994)Google Scholar
16. Malandrino, G., Fragula, I. L., Neumayer, D. A, Stern, C. L., Hinds, B. J. and Marks, T. J, J. Mater. Chem. 4(7) 1061–6 (1994)Google Scholar
17. Hammond, G. S., Nonhebel, D. C. and Wu, C.H.S., Inorg. Chem. 2 73–76 (1963)Google Scholar
18. Drake, S. R., Hursthouse, M. B., Malik, K. M. Abdul and Otway, D. J., JCS Dalton 1993 2883–90Google Scholar
19. Turova, N. Ya., Turevskaya, E. P., Yanovskaya, M. I., Kotova, N. M. and Shifrina, R. R., Russ. J. Inorg. Chem. 38(7) 1055–9 (1993)Google Scholar
20. Fogg, P.G.T. and Gerrard, W., Solubility of Gases in Liquids, Wiley, J., New York (1990) pp. 295–7Google Scholar