The deposition and post-treatment processes involved in the production of porous organosilicate glasses (OSGs) by plasma-enhanced chemical vapor deposition (PECVD) with ultraviolet light (UV) treatment are investigated through the use of a deuterated organic porogen precursor using infrared spectroscopy and solid-state nuclear magnetic resonance spectroscopy. Infrared analysis provides evidence for hydrogen-deuterium scrambling between the chemical species during the deposition process, which is exacerbated by the UV treatment process. Analysis of 13C cross-polarized magic angle spinning (CP-MAS) NMR suggests that the porogen exists in domains relatively isolated from the network, in agreement with short UV treatment time morphological data that indicates the pore size is relatively constant from the early stages of UV treatment process. The chemical and morphological information provides further support for a deposition controlled morphology and has implications towards enhanced chemical processing of porous organosilicate glass (OSG) films for back-end-of-line integrated circuit manufacturing.