Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T18:43:13.518Z Has data issue: false hasContentIssue false

Formation of Pb Inclusions in Si by Ion Implantation

Published online by Cambridge University Press:  10 February 2011

V. S. Touboltsev
Affiliation:
Ørsted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK 2100 Copenhagen Ø, Denmark.
E. Johnson
Affiliation:
Ørsted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK 2100 Copenhagen Ø, Denmark.
U. Dahmen
Affiliation:
National Center for Electron Microscopy, E.O. Lawrence Berkeley National Laboratory, UC Berkeley, CA, USA
A. Johansen
Affiliation:
Ørsted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK 2100 Copenhagen Ø, Denmark.
L. Sarholt
Affiliation:
Ørsted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK 2100 Copenhagen Ø, Denmark.
S. Q. Xiao
Affiliation:
Ørsted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK 2100 Copenhagen Ø, Denmark.
Get access

Abstracr

Si<110> single crystals were implanted at a temperature of 835 K with 150 keV Pb+ ions to a fluence of 1·1020 m−2 corresponding to an average concentration of 2–3 at%. The implanted samples have been studied by Rutherford Backscattering (RBS)/channeling and transmission electron microscopy (TEM) techniques. In as-implanted samples the main fraction of implanted Pb was located on substitutional sites in the Si matrix thus providing a highly supersaturated solution of Pb in Si. Spontaneous precipitation of Pb, giving rise to formation of nanosized Pb inclusions, was found to take place only in the peak region of the implantation. TEM analysis showed that the Pb precipitates had sizes from about 2 to 20 nm and that they grew in parallel cube orientation relationship with the host matrix. The shape of the inclusions was found to be approximately cuboctahedral with poorly developed {111} and {100} facets.

In-situ RBS/channeling heating/cooling experiments on both as-implanted samples and samples previously furnace-annealed at 1175 K showed a distinct melting/solidification hysteresis of the Pb inclusions around the bulk melting point for Pb at 600 K. These results were verified by in-situ TEM heating/cooling experiments on as-implanted samples.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] H..Andersen, H. and Johnson, E., Nucl. Instr. and Meth. B 106 (1995) 480.Google Scholar
[2] Xiao, S.Q., Johnson, E., Hinderberger, S., Johansen, A., Bourdelle, K.K. and Dahmen, U., J. Microscopy 180 (1995) 61.Google Scholar
[3] Moore, K.I., Zhang, D.L. and Cantor, B., Acta Metal. Mater. 38 (1990) 1327.Google Scholar
[4] Zhang, D.L. and Cantor, B., Phil.Mag. A 62 (1990) 557 Google Scholar
[5] Zhang, D.L., Chattopadhyay, K. and Cantor, B., J.Mater.Sci. 26 (1991)1536 Google Scholar
[6] Johnson, E., Johansen, A., Thoft, N.B., Andersen, H.H. and Sarholt-Kristensen, L., Philos.Mag.Lett. 68 (1993) 131.Google Scholar
[7] Solmi, S., Baruffaldi, F. and Derdour, M., J. Appl. Phys. 71 (1992) 697.Google Scholar
[8] Olesinski, R.W. and Abbaschian, G.J., Binary Alloy Phase Diagrams, edited by Massalski, T.B., Murray, J.L., Bennett, L.H. and Baker, H. (Metals Park, Ohio: ASM) (1986)1845.Google Scholar
[9] J.F., Ziegler, J.P., Biersack, and U., Littmark, 1985, The Stopping and Ranges of Ions in Solids (Pergamon, New York).Google Scholar
[10] Andersen, H.H., Bottiger, J. and Wolder-Jorgensen, H., Appl. Phys. Lett. 26 (19??) 678.Google Scholar
[ 11 ] Frank, W., Crucial Issues in Semiconductor Materials and Processing Technologies, editedby Coffa, S., Priolo, F., Rimini, E., and Poate, J.M., NATO ASI Series E: Applied Sciences, Vol. 222, Kluwer Academic Publishers, Dordrecht-Boston-London 1992, p. 383.Google Scholar
[12] Bourdelle, K.K., Khodyrev, V.A., Johansen, A., Johnson, E., and Sarholt-Kristensen, L., Phys.Rev.B, 50 (1194) p.82 Google Scholar
[13] Saka, H., Nishikawa, Y. and Imura, T., Philos. Mag. A57 (1988) 895.Google Scholar