Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-23T13:10:50.944Z Has data issue: false hasContentIssue false
  • English
  • Français

Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning

Published online by Cambridge University Press:  31 January 2011

Simon Ruffell ,
Dinesh Kumar Venkatachalam ,
Avi Shalav  and
Robert G. Elliman
Simon Ruffell
Affiliation:
[email protected], Australian National University, EME/RSPE, Canberra, Australian Capital Territory, 0200, Australia
Dinesh Kumar Venkatachalam
Affiliation:
[email protected], Australian National University, Canberra, Australian Capital Territory, Australia
Avi Shalav
Affiliation:
[email protected]@gmail.com, The Australian National University, Electronic Materials Engineering, The Research School of Physical Sciences and Engineering, Building 60; ANU Campus, Canberra, Australian Capital Territory, 2602, Australia
Robert G. Elliman
Affiliation:
[email protected], Australian National University, Canberra, Australian Capital Territory, Australia
Get access

Abstract

Ordered arrays of gold particles have been fabricated on gold-coated Si(100) surfaces by pre-patterning the surface with a nanoindenter. During thermal annealing the Au is observed to accumulate within the residual indents. Once nucleated, the Au particles grow at the expense of smaller surface particles via an Ostwald-ripening process. The size of the Au particles is controlled by the initial thickness of the deposited Au layer, the size of the indentation (which is controlled with a high degree of precision), and the annealing conditions. Particles of ˜200 nm dimensions are formed in indents of ˜1 μm dimensions whilst nanoparticles of ˜20 nm are observed in the smallest indents made (˜50 nm). We have also demonstrated patterning of Au by indentation of a Au layer sandwiched between two SiO2 films deposited on Si by plasma-enhanced chemical vapour deposition. Here, cracking of the SiO2 layer occurs allowing Au to diffuse to the surface at the indented locations during post-indentation annealing.

Keywords

nanoscalenano-indentationAu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1228: Symposium KK – Nanoscale Pattern Formation , 2009 , 1228-KK13-05
Copyright
Copyright © Materials Research Society 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Materials Research Society Bulletin, 2007. 32(5).Google Scholar
2 Gherasimova, M. Hull, R. Reuter, M. C. and Ross, F. M. Applied Physics Letters, 2008. 93: p. 023106.Google Scholar
3 Borgstrom, M. Zela, V. and Seifert, W. Nanotechnology, 2003. 14: p. 264.Google Scholar
4 Fuhrmann, Bodo et al. , Nanoletters, 2005. 5(12): p. 2524.Google Scholar
5 Nielson, Peter, Hassing, Soren, Alkbrektsen, Ole, Foghmoes, Soren and Morgen, Per, Journal of Physical Chemistry C, 2009. 113(32): p. 14165.Google Scholar
6 Santos, V. Luis De Los, Lee, Dongwook, Seo, Jiwon, Leon, F. Lizbet, Bustamante, D. Angel, Suzuki, Seiichi, Majima, Yutaka, Mitrelias, Thanos, Ionescu, Adrian and Barnes, Crispin H.W. Surface Science, 2009. 603: p. 2978.Google Scholar
7 Golan, Yuval, Margulis, Lev and Rubinstein, Israel, Surface Science, 1992. 264: p. 312.Google Scholar
8 Venables, John A. Surface Science, 1994. 299/300: p. 798.Google Scholar
9 Allmen, M. von, Lau, S.S. Maenpaa, M. and Tsaur, B.Y. Applied Physics Letters, 1980. 36: p. 205.Google Scholar
10 Ruffell, S. Venkatachalam, D. K. Shalav, A. and Elliman, R. G. unpublished.Google Scholar