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Formation and Structure of Epitaxial NiSi2 and CoSi2

Published online by Cambridge University Press:  15 February 2011

L. J. Chen
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853 (U.S.A.)
J. W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853 (U.S.A.)
K. N. Tu
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598 (U.S.A.)
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Transmission electron microscopy has been applied to study the formation and structure of epitaxial NiSi2 and CoSi2 thin films on silicon. Bright field and dark field imaging reveal the interface planes of faceted silicides through the strain contrast, analogous to the contrast of the precipitate-matrix interface of coherent or semicoherent precipitates. Superlattice dark field imaging depicts the distribution of twin-related and epitaxial silicides in these systems. { 111 } interfaces were found to be more prominent than {001} interfaces. Twin-related silicides were observed to cover more area on the substrate silicon than epitaxial silicides did.

In situ annealing of nickel and cobalt thin films on silicon provides a unique means of investigation of the transformation from polycrystalline to epitaxial silicides. The NiSi2 transformation was found to be very rapid at 820°C, whereas the CoSi2 transformation appeared to be very sluggish. Furnace annealing confirmed that only a small fraction of CoSi2 transforms to epitaxial CoSi2 after annealing at 850°C for 4h.

Diffraction contrast analysis has been applied to interfacial dislocations of epitaxial NiSi2/Si and CoSi2/Si systems. The dislocations were found to be of edge type with ⅙<112> and ½<110> Burgers' vectors. The average spacings are close to their respective theoretically predicted values.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

REFERENCES

1 Tu, K. N., Alessandrini, E. I., Chu, W. K., Krautle, H. and Mayer, J. W., Jpn. J. Appl. Phys., Suppl. 2, Part 1(1974)669.CrossRefGoogle Scholar
2 Ishiwara, H., in Baglin, J. E. E. and Poate, J. M. (eds.), Proc. Symp. on Thin Film Interfaces and Interactions, Los Angeles, CA, 1979, Electrochemical Society, Princeton, NJ, 1980, p. 159.Google Scholar
3 Saitoh, S., Ishiwara, H. and Furukawa, S., Appl. Phys. Lett., 37(1980) 203.Google Scholar
4 Bean, J. C. and Poate, J. M., Appl. Phys. Lett., 37 (1980) 643.Google Scholar
5 van Gurp, G. J. and Langereis, C., J. Appl. Phys., 46 (1975) 4301.Google Scholar
6 Lau, S. S., Mayer, J. W. and Tu, K. N., J. Appl. Phys., 49 (1978) 4005.Google Scholar
7 Lau, S. S. and Cheung, N. W., Thin Solid Films, 71 (1980) 117.Google Scholar
8 Föll, H., Ho, P. S. and Tu, K. N., J. Appl. Phys., 52(1981) 250.Google Scholar
9 Föll, H., Ho, P. S. and Tu, K. N., Philos. Mag. A, 45 (1982) 31.Google Scholar
10 Chen, L. J., Mayer, J. W., Tu, K. N. and Sheng, T. T., Thin Solid Films, 93 (1982) 91.Google Scholar
11 Chiu, K. C. R., Poate, J. M., Rowe, J. E., Sheng, T. T. and Cullis, A. G., Appl. Phys. Lett., 38(1981)988.Google Scholar
12 Chen, L. J., Hung, L. S. and Mayer, J. W., Appl. Surf. Sci., to be published.Google Scholar
13 Sheng, T. T. and Chang, C. C., IEEE Trans. Electron Devices, 23 (1976) 531.Google Scholar
14 Weatherly, G. C., Acta Metall., 19 (1971) 181.Google Scholar