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Formation and Growth of Voids And/Or Gas Bubbles in Thin Films

Published online by Cambridge University Press:  15 February 2011

J. R. Lloyd  and
S. Nakahara
J. R. Lloyd
Affiliation:
IBM, East Fishkill Facility, Hopewell Junction, NY12533(U.S.A.)
S. Nakahara
Affiliation:
Bell Laboratories, Murray Hill, NJ07974(U.S.A.)
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Abstract

Several recent transmission electron microscopy studies have shown that small voids and/or gas bubbles are present in various thin metallic films. The formation and growth of these voids have been studied as a function of the deposition and subsequent annealing conditions. From these studies, two conflicting views as to why these voids grow have emerged. Some investigators claim that the void growth occurs as a result of the precipitation of trapped gaseous impurities, whereas others believe that the growth is due to the annihilation of quenched-in excess vacancies at pre-existing voids. In this paper we present arguments with which we hope to resolve the present controversy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 10: Symposium C – Thin Films and Interfaces I , 1981 , 289
Copyright
Copyright © Materials Research Society 1982

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References

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