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The Formation Al2O3/V2O3 Multilayer Structures by High-Dose Ion Implantation

Published online by Cambridge University Press:  15 February 2011

Laurence A. Gea ,
L. A. Boatner ,
Janet Rankin  and
J. D. Budai
Laurence A. Gea
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831
L. A. Boatner
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831
Janet Rankin
Affiliation:
Brown University, Providence, RI 02912
J. D. Budai
Affiliation:
Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831
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Abstract

High-resolution TEM, RBS-channeling and x-ray-diffraction techniques have been used to characterize multilayered structures formed by the high-dose co-implantation of vanadium and oxygen into single crystals of cx-A1203. Thin, two-dimensional multilayered structures have been formed by implanting c -axis and a -axis-oriented single crystals of A1203 at room temperature with vanadium (1017 ions/cm2 at 300 keV) and oxygen (2 × 1017 ions/cm 2, 120 keV) followed by a rapid anneal at 1000ºC. Cross-sectional TEM studies showed thatthis process produced a buried layer of V2O3 located about 120 nm below the A12O3 surface. X-raydiffraction investigations revealed that this layer is epitaxially oriented in three dimensions with respect to the host A12O3 lattice. The orientational relationship was subsequently confirmed by RBS/ channeling techniques. V2O3 exhibits a first-order phase transition at about 155 K that is accompanied by striking changes in its electrical and opticalproperties, and this phase transition was observed through in-situ TEM cooling studies ofcross-sectional samples.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 382: Symposium G – Structure and Properties of Multilayered Thin Films , 1995 , 107
Copyright
Copyright © Materials Research Society 1995

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References

[1] McWhan, D. B. and Remeika, J. P., Phys. Rev. B 2, 3734 (1970).; S. Minomura, and H. Nagasaki, J. Phys. Soc. Japan 19, 131 (1964).Google Scholar
[2] Morin, F. J., Phys. Rev. Lett. 3, 34 (1959).Google Scholar
[3] Case, F. C., J. Vac. Sci. Technol. A9(3), 461 (1991).Google Scholar
[4] Stringer, J., J. Less. Comm. Met. 8, 1 (1965).Google Scholar
[5] Gea, L. A., Boatner, L.A., Rankin, J., Budai, J. D., Mater.Res.Soc.Proc. 235, 1995).Google Scholar
[6] “Thermal expansion- Non Metallic Solids”, vol.13, (Plenum, New York, 1977), p.176.Google Scholar
[7] extrapolation from values in McWhan, D. B. and Remeika, J. P., Phys. Rev. II 2, 3734 (1970)Google Scholar
[8] Case, F.C., J. Vac. Sci. Technol. A2(4), 1509 (1984).Google Scholar
[9] Feinleib, J.. Paul, W., Phys.Rev. 155, 841 (1967)Google Scholar