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Fine Line Patterning By Focused Ion Beam Induced Decomposition of Palladium Acetate Films

Published online by Cambridge University Press:  28 February 2011

L. R. Harriott ,
K. D. Cummings ,
M. E. Gross ,
W. L. Brown ,
J. Linnros  and
H. O. Funsten
L. R. Harriott
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
K. D. Cummings
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
M. E. Gross
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
W. L. Brown
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
J. Linnros
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
H. O. Funsten
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
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Abstract

Fine conducting features have been produced on Si and SiO2 substrates by irradiation of spin-on palladium acetate, [Pd(O2CCH3)2]3 films with a submicron focused ion beam. The exposures were made with a 20 keV Ga+, focused to a 0.2 micrometer spot. Electrical conductivity measuremnents were made on the resultant features as a function of ion dose for linewidths of one and ten micrometers. The sheet conductivity in the two cases was comparable and increased dramatically in the dose range between 2×1014 and 5×1014 ions/cm2. The conductivity of the exposed lines was further increased after heating in a hydrogen atmosphere. Measurements of carbon and oxygen content indicate that even at the highest ion doses a significant amount of organic material remains. Results are compared to those for 2 MeV He+ and Ne+ broad beam exposures. Potential applications are also discussed.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 99
Copyright
Copyright © Materials Research Society 1987

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References

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