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The Field Emission Gun Scanning Electron Microscopehigh Resolution at Low Beam Energies

Published online by Cambridge University Press:  21 February 2011

David C Joy*
Affiliation:
EM Facility, University of Tennessee, Knoxville, TN 37996-0810 and Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

The scanning electron microscope (SEM) is the most widely used, as well as the most versatile, of electron-optical instruments. In all of the imaging modes of the instrument it is now possible to achieve a spatial resolution on the nanometer scale from a bulk specimen, provided that the electron-optical performance of the instrument is of the necessary quality. In practice this means that a field emission gun (FEG) as well as a highly excited probe forming lens must be used. With state-of-the-art instrumentation, image resolutions as good as 4 - 5 nm at lkeV, and lnm at 20keV, are now achievable. This paper outlines the design criteria for a high resolution FEG SEM and discusses the type of image information available. The performance achieved is compared to that of other types of microscope that offer similar capabilities.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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