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Ferroelectric Thin Films on Silicon and Fused Silica Substrates by Sol-Gel Process

Published online by Cambridge University Press:  16 February 2011

Yuhuan Xu
Affiliation:
Department of Materials Science and Engineering, University of California, Los Angeles, CA 90024
Ching Jih Chen
Affiliation:
Department of Materials Science and Engineering, University of California, Los Angeles, CA 90024
Ren Xu
Affiliation:
Department of Materials Science and Engineering, University of California, Los Angeles, CA 90024
John D. Mackenzie
Affiliation:
Department of Materials Science and Engineering, University of California, Los Angeles, CA 90024
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Abstract

Ferroelectric thin films including undoped and doped PZT (lead zirconate titanate), BaTiO3 (barium titanate), SBN (strontium barium niobate), KNbO3 (potassium niobate), PBN (lead barium niobate), KNSBN (potassium sodium strontium barium niobate), and LiNbO3 (lithium niobate) were made on silicon and fused silica substrates by a sol-gel process. Microstructure and physical (pyroelectric, ferroelectric and optical) properties of these thin films were studied. Transparent and preferentially orientated SBN thin films on fused silica substrates can be obtained by applying a d.c. electric field during heat treatment. A heterojunction effect was observed in ferroelectric thin films on both n-silicon and p-silicon through measurement of I-V characteristics, and by the demonstration of a photocurrent effect.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

[1] Minakata, Mfakoto et. al., J. Appl. Phys., 50, 7898 (1979).Google Scholar
[2] Foster, N. F., J. Appl. Phys., 40, 420 (1969).Google Scholar
[3] Castellans, R. N. and Feinstein, L. G., J. Appl. Phys., 50, 4406 (1979).Google Scholar
[4] Glass, A. M., Phys. Rev., 172, 564 (1968).Google Scholar
[5] Beerman, H. P., Ferroelecterics, 2, 123 (1971).Google Scholar
[6] Glass, A. M. and Abrams, R. L., J. Appl. Phys., 41, 4455 (1970).Google Scholar
[7] Chapman, D. W., J. Vac. Sci. Technol., 9, 425 (1972).Google Scholar
[8] Atkin, R. B., Ferroelectrics, 3, 213 (1971).Google Scholar
[9] Wu, S. Y., Takei, W. J., Francombe, M. N., and Cummins, S, E., Ferroelectrics, 3, 217 (1972).Google Scholar
[10] Chapman, D. W., In “Proc. IEEE. Comp. Gp. Conf.” Washington (1970).Google Scholar
[11] Chapman, D. W. and Mehta, P. R., Ferroelectrics, 3, 101 (1972).Google Scholar
[12] Mehta, P. R., Ferroelectrics, 4, 5 (1972).Google Scholar
[13] Webster, J. C. and Zemike, F., Ferroelctrics, 10, 249 (1976).Google Scholar
[14] Wu, S. Y., Ferorelectrics, 11, 379, (1976).Google Scholar
[15] Wu, Shu-Yau, IEEE Trans. on Electron. Devices, ED–21[8], 499, (1974).Google Scholar
[16] Burfoot, J. C., ”Pyroelectric and Ferroelectric Thin film Devices” (Coutts, T. J. Ed.:« Active and Passive Thin Film Devices ») 697741, Acadamic Press, 1978.Google Scholar
[17] Francombe, M. H.: “Ferroelectric Film and Their Device Applications”, Thin Solid Film, 13, 413433, 1972.Google Scholar
[18] Chen, C. J. et. al. Proc. of 1st symp. on Integrated Ferroelectrics, CMC-89, Colorado, March, 1989 (to be published in Ferroelectrics).Google Scholar
[19] Mosset, A., et. al., J. Non-Crystalline Solids, 100, 339 (1988).Google Scholar
[20] Budd, K. D., Dey, S. K. and Payne, D. A., Mat. Res. Soc. symp. Proc., 73, 711 (1986).Google Scholar
[21] Dey, S. K., Budd, K. D. and Payne, D. A., IEEE Trans. on Ultrasonics Ferroelectrics and Frequency Control, 35[1], 80 (1988).Google Scholar
[22] Budd, K. D., Dey, S. K. and Payne, D. A., Brit. Cer. Soc. Proc., 36 107 (1985).Google Scholar
[23] Hirano, S., and Kato, K., J. Non-Crystalline Solids, 100, 538 (1988).Google Scholar
[24] Vest, R. W., and Xu, J., Ferroelectrics, 93, 21 (1989).Google Scholar
[25] Lines, M. E., and Glass, A. M., «Principlesa nd Applications of Ferroelectricsa nd Related Materials », Clarendon Press, Oxford, 1977.Google Scholar
[26] Yuhuan, Xu, Ching-Jih, Chen, Ren, Xu and Mackenzie, J. D., J. Appl. Phys., 67, 2985 (1990).Google Scholar