Hostname: page-component-cd9895bd7-mkpzs Total loading time: 0 Render date: 2024-12-27T01:44:18.706Z Has data issue: false hasContentIssue false

Ferroelectric Properties and Crystalline Structures of BaMgF4 Thin Films Grown on Pt(111)/SiO2/Si(100)

Published online by Cambridge University Press:  10 February 2011

Masashi Moriwaki
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226, Japan
Koji Aizawa
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226, Japan
Eisuke Tokumitsu
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226, Japan
Hiroshi Ishiwara
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226, Japan
Get access

Abstract

Crystalline quality and ferroelectric properties of (120)-oriented BaMgF^BMF) films grown on Pt(111)/SiO2/Si(100) and n-Si(111) substrates have been investigated. The BaMgF4 films grown on Pt(111) have large and flat grains, while the films on Si(111) have small grains. The C-V curve of BaMgF4/Pt(111)/SiO2/Si(100) diodes showed a hysteresis loop with a memory window of 3.8V.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Ishiwara, H.: Jpn. J. Appl. Phys. 32(1993) 442.Google Scholar
[2] Higuma, Y., Matsui, Y., Okuyama, M., Nakagawa, T. and Hamakawa, Y.: Jpn. J. Appl. Phys. 17 (1977) 209.Google Scholar
[3] Tokumitsu, E., Itani, K., Moon, B. K. and Ishiwara, H.: Jpn. J. Appl. Phys. 34 (1995) 5202.Google Scholar
[4] Wu, S. Y.: IEEE Trans. Electron Devices, ED–21.(1974) 499.Google Scholar
[5] Sinharoy, S., Buhay, H., Burke, M. G., Lampe, D. R., and Poliak, T. M.: IEEE Trans. Ultras. Ferroelectr. & Freq. Control 38(1991) 663.Google Scholar
[6] Aizawa, K., Ishiwara, H. and Kumagai, M.: Appl. Phys. Lett. 63 (1993) 1765.Google Scholar
[7] Aizawa, K., Ichiki, T., and Ishwara, H.: Mater. Res. Soc. Proc. 310, San Francisco, CA (1993) 313.Google Scholar
[8] Aizawa, K. and Ishiwara, H.: Jpn. J. Appl. Phys. 33 (1994) 5178.Google Scholar
[9] Aizawa, K., Ichiki, T., Okamoto, T., Tokumitsu, E. and Ishiwara, H.: Jpn. J. Appl. Phys. 35 (1996) 1525.Google Scholar
[10] Aizawa, K., Moriwaki, M., Ichiki, T., Tokumitsu, E. and Ishiwara, H.: Jpn. J. Appl. Phys. 36 (1997) 234.Google Scholar
[11] Aizawa, K. and Ishiwara, H.: Proc. First Into. Symp. on Control of Semiconductor Interfaces, Karuizawa, Japan (1993) 283.Google Scholar