Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-19T04:36:07.415Z Has data issue: false hasContentIssue false
  • English
  • Français

Ferroelectric Film Synthesis, Past and Present: A Select Review

Published online by Cambridge University Press:  16 February 2011

R. A. Roy ,
K. F. Etzold  and
J. J. Cuomo
R. A. Roy
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
K. F. Etzold
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
J. J. Cuomo
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
Get access

Abstract

A review of the history of ferroelectric (FE) thin film synthesis is given covering the period of the 1960's to the present. Early methods, materials and applications are discussed. An assessment of the recent upsurge in activity takes note of current targeted applications, including nonvolatile memory, piezoelectric actuators, capacitors, and electro-optic devices. Focus is placed on similarities and differences in the most common film deposition processes. Comparison of microstructure and composition variation seen in films deposited by sputtering, laser ablation, and solution deposition is made. More detailed understanding of process-microstructure relations is stressed as necessary for film property control. Also discussed are the roles of substrate interactions and interface layers in thin film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 141
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Feldman, C., Rev. Sci. Instr. 26 (1955) 463 Google Scholar
2. Moll, A., Z. angew. Phys. 10 (1958) 410 Google Scholar
3. Muller, E. K., Nicholson, B. J., and Turner, G. E.,J. Electrochem. Soc., 110 (1963) 969 Google Scholar
4. Feuersanqer, A. E., Hagenlocher, A. K., and Solomon, A. L., J. Electrochem. Soc. 111 (1964) 1387 Google Scholar
5. 1. Pratt, H. and Firestone, S., J. Vac. Sci. Technol., 8 (1971) 256 Google Scholar
6. Pennebaker, W. B., IBM J. Res. Dev., (1969) 686 Google Scholar
7. Foster, N. F., J. Appl. Phys., 40 (1969) 420 Google Scholar
8. Takei, W. J., Formigoni, N. P., and Francombe, M. H., J. Vac. Sci. Technol., 7, (1969) 442 Google Scholar
9. Cummins, S. E. and Cross, L. E., J. Appl. Phys, 39, (1968) 2268 Google Scholar
10. Chapman, D. W., J. Appl. Phys., 40 (1969) 2381 Google Scholar
11. Atkin, R. B., Ferroelectrics, 3 (1972) 213 Google Scholar
12. Oikawa, M. and Toda, K., Appl. Phys. Lett., 29 (1976) 491 Google Scholar
13. Ishida, M., Matsunami, H., and Tanaka, T., J. Appl. Phys. 48. (1977) 951 Google Scholar
14. Ishida, M., Tsuji, S., Kimura, K., Matsunami, H., and Tanaka, T., J. Cryst. Growth 45 (1978) 393 Google Scholar
15. Shintani, Y., Sato, K., Sakamoto, M., Fukuda, H., and Tada, O., Jpn. J. Appl. Phys., 17 (1978) 573 Google Scholar
16. Adachi, H., Kawaquchi, T., Kitabatake, M., and Wasa, K., Jpn. J. Appl. Phys., 22 S22(2) (1983) 11 Google Scholar
17. lijima, K., Tomita, Y., Takayama, R., Ueda, I., J. Appl. Phys. 60 (1986) 361 M. Okada, S. Takai, M. Amemiya, and K. Tominaga, Jap. J. Appl. Phys.,Google Scholar
18. lijima, K., Takayama, R., Tomita, Y., Ueda, I., J. Appl. Phys. 60 (1986) 2914 Google Scholar
19. Shohata, N., Matsubara, S. Miyasaka, Y. and Yonezawa, M., in Proc. 6th Symp. Appl. Ferroelectricity, (IEEE N.Y., 1H86) 580Google Scholar
20. Krupanidhi, S. B., Maffei, N., Sayer, M., and El-Assal, K., J. Appl. Phys., 54 (1983) 6601 Google Scholar
21. Sreenivas, K., Sayer, M., Baar, D. J., and Nishioka, M., Appl. Phys. Lett., 52 (1988) 709 Google Scholar
22. Budd, K. D., Dey, S. K., and Payne, D. A., Br. Ceram. Proc., 36 (1985), 107 Google Scholar
23. Xu, J. J., Shaikh, A. S., and Vest, R. W., in IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency control. (1989) 307 Google Scholar
24. Kojima, M., Okuyama, M., Nakagawa, T., and Hamakawa, Y., Jpn. J. Appl. Phys., 22 (suppl.22–2) (1983) 14 Google Scholar
25. Okada, M., Takai, S., Amemiya, M., and Tominaga, K., Jap. J. Appl. Phys., 28 (1989) 1030 Google Scholar
26. Davis, G. M. and Gower, M. C., Appl. Phys. Lett., 55 (1989) 112 Google Scholar
27. lijima, K., Terashima, T., Yamamoto, K., Hirata, K., and Bando, Y., Appl. Phys. Lett., 56 (1990) 527 Google Scholar
28. Scott, J. F., Godfrey, R. B., Araujo, C. A., McMillan, L. D., Meadows, H. B. and Golabi, M., Proc. 6th Symp. Appl. Ferroelectricity, (IEEE N.Y., 1986) 569Google Scholar
29. Evans, J. T. and Womack, R., IEEE J. Solid State Circuits, 23 (1988) 1171 Google Scholar
30. Horton, R. in Proceedings of the Conference on Ferroelectric Integrated Devices (Colorado Springs, CO, March, 1989) (Special Issue of Ferroelectrics, Araujo, C. A., Ed., in Press)Google Scholar
31. Roy, R., Etzold, K. F., and Cuomo, J. J., Mat. Res. Soc. Sci. Symp. Proc. (this volume)Google Scholar
32. Castellano, R. N. and Feinstein, L. G., J. Appl. Phys., 50 (1979) 4406 Google Scholar
33. Sayer, M. Proc. 6th Symp. Appl. Ferroelectricity (IEEE N.Y., 1986) 560 Google Scholar
34. Doyle, J. P., Roy, R. A., and Yee, D. S. AIP Conf. Proc.(1989)Google Scholar
35. Saenger, K. L., Roy, R. A., Etzold, K. F., and Cuomo, J. J., Mat. Res. Soc. Symp. Proc. (this volume)Google Scholar
36. Ainger, F., Brierly, C. J., Hudson, M. D., Trundle, C., and Whatmore, R. W., i.b.i.dGoogle Scholar
37. Kingon, A. I., Auciello, O., Ameen, M. S., Rou, S. H., and Krauss, A. R., Appl. Phys. Lett., 55 (1989) 301 Google Scholar
38. Kingon, A. I., Auciello, O. H., Ameen, M. S., Soble, C. N., Graettinger, T. M., Rou, S. H., and Krauss, A. R., Am. Cer. Soc. Conf. Proc., (Symposium on Thick and Thin Films, Indianapolis, IN, April., 1989, Ed. Hiremath, B. V., in press)Google Scholar
39. Gilbert, L. R., PhD Thesis, The Pennsylvania State University, 1979 Google Scholar
40. Kester, D., MS Thesis, The Pennsylvania State University, 1985 Google Scholar
41. Rossnagel, S. M., Cuomo, J. J., AVS Soc. Symp. Proc., 165 (1988) 106 Google Scholar
42. Li, X. X., Linker, G., Meyer, O., Nold, E., Orbst, B., Ratzel, F., Smithey, R., Strehrlau, B., Weschenfelder, F., and Geerk, J., Z. Phys. B, 74 (1989) 13 Google Scholar
43. Lee, W. Y., Salem, J., Lee, V., Reuttner, C. T. Gorman, G, Savoy, R., Deline, V., and Huang, T. C., Thin Sol. Films, 166 1988) 181 Google Scholar
44. Doyle, J. P., Roy, R. A., and Cuomo, J. J., Thin Sol. Films (in press)Google Scholar
45. Meyer, F., Bouchier, D., Stambouli, V., Pellet, C., Schwebel, C., and Gautherin, G., Appl. Surf. Sci., 38 (1989) 286 Google Scholar
46. Auciello, O., Ameen, M. S., Krauss, A. R., and Kingon, A. I., Mat. Res. Soc. Symp. Proc. 157 (1990)Google Scholar
47. Saenger, K. L., J. Appl. Phys, 66 (1989) 4435 Google Scholar
48. Goehegan, D. B. and Mashburn, D. N., Mat. Res. Soc. Symp. Proc., 169 (1990)Google Scholar
49. Lynds, L., Weinberger, B. R., and Potrepka, D. M., Laser Ablation For Materials Synthesis, Mat. Res. Soc. Symp. Proc. (1990, to be published)Google Scholar
50. Dana, S. S., Mat. Res. Soc. Symp. Proc. (this volume)Google Scholar
51. Francis, L. F. and Payne, D. A., i.b.i.d.Google Scholar
52. Matsubara, S., Yamamichi, S., Yamaguchi, H., and Miyazaki, Y., i.b.i.d.Google Scholar
53. Etzold, K. F., Roy, R. A., Saenger, K. L., and Cuomo, J. J., i.b.i.d.Google Scholar
54. Hsueh, C.-C. and Mecartney, M., i.b.i.d.Google Scholar
55. Meyers, S. A. and Chapin, L. N., i.b.i.d.Google Scholar
56. Hirano, S., Kikuta, K., and Kato, K., i.b.i.d.Google Scholar