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Fabrication of ZnO Bridging Nanowire Device by a Single-Step Chemical Vapor Deposition Method

Published online by Cambridge University Press:  01 February 2011

Yanbo Li ,
Ippei Nagatomo ,
Ryohei Uchino ,
Ichiro Yamada  and
Jean-Jacques Delaunay
Yanbo Li
Affiliation:
[email protected], The University of Tokyo, Tokyo, Japan
Ippei Nagatomo
Affiliation:
[email protected], The University of Tokyo, Tokyo, Japan
Ryohei Uchino
Affiliation:
[email protected], The University of Tokyo, Tokyo, Japan
Ichiro Yamada
Affiliation:
[email protected], The University of Tokyo, Tokyo, Japan
Jean-Jacques Delaunay
Affiliation:
[email protected], The University of Tokyo, Tokyo, Japan
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Abstract

ZnO nanowires are directly integrated into a working device by a single-step chemical vapor deposition (CVD) method. Gold catalyst is patterned on a quartz glass substrate using a comb-shaped shadow mask and then ZnO is grown on the patterned substrate by CVD. Thick ZnO layers formed on the gold-patterned areas serve as native electrodes. Ultra-long (˜100 μm) ZnO nanowires grown across the gap between the ZnO electrodes and the nanowires serve as the sensing elements of the device. The device exhibits high sensitivity and fast response to UV illumination in air. Our method can be used to fabricate other metal oxide semiconductor bridging nanowire devices, which have promising applications in photodetection and gas sensing.

Keywords

photoconductivitychemical vapor deposition (CVD) (deposition)nanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1144: Symposium LL – Nanowires–Systhesis, Properties, Assembly and Applications , 2008 , 1144-LL17-03
Copyright
Copyright © Materials Research Society 2009

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