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Fabrication of Tin Loaded Resorcinol Formaldehyde Aerogel Spheres for Extreme Ultraviolet Source Emission

Published online by Cambridge University Press:  01 February 2011

Reny R Paguio ,
Abbas Nikroo ,
Chris A Frederick ,
Jared F Hund  and
Mary Thi
Reny R Paguio
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States, 858-455-3953
Abbas Nikroo
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Chris A Frederick
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Jared F Hund
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Mary Thi
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
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Abstract

Low density Sn doped resorcinol formaldehyde aerogels were fabricated for extreme ultraviolet (EUV) source emission lithography experiments (EUVL). EUVL is a candidate to succeed conventional optical lithography. EUVL requires a reliable emission (13.5 nm) source. One type of source is a laser-produced plasma. Several laser-plasma source materials have been considered such as lithium, xenon and tin. Tin is considered ideal because it has a high conversion effeciency. However, solid tin targets create a large quantity of debris which can damage the optics of the laser system. As a solution to this problem, we minimized the amount of tin by dispersing it in a low density resorcinol formaldehyde (R/F) matrix. These targets were fabricated into small spheres using the microencapsulation method. Initial experimental results show that these targets yield a similar intensity in the EUV regime when compred to a full density Sn target.

Keywords

aerogelsol-gellithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O14-02
Copyright
Copyright © Materials Research Society 2007

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