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Fabrication of Nanoscale Gold Clusters by Low Energy Ion Irradiation

Published online by Cambridge University Press:  01 February 2011

Volha Abidzina
Affiliation:
[email protected], Belarusian-Russian University, Belarusian-Russian University, Prospect Mira 43, Mogilev, 212005, Belarus, +375-296-466821
I. Tereshko
Affiliation:
[email protected], Belarusian-Russian University, Prospect Mira 43, Mogilev, 212005, Belarus
I. Elkin
Affiliation:
[email protected], Research and Production Enterprise "KAMA VT" Plc., Karl Liebknecht Str. 3a, Mogilev, 212000, Belarus
V. Red'ko
Affiliation:
[email protected], Belarusian-Russian University, Prospect Mira 43, Mogilev, 212005, Belarus
S. Budak
Affiliation:
[email protected], Center for Irradiation of Materials, Alabama A&M University, Normal, AL, 35762-1447, United States
C. Muntele
Affiliation:
[email protected], Center for Irradiation of Materials, Alabama A&M University, Normal, AL, 35762-1447, United States
D. Walker
Affiliation:
[email protected], University of Alabama in Huntsville, Physics Dept.,, Huntsville, AL, 35899, United States
D. Ila
Affiliation:
[email protected], Center for Irradiation of Materials, Alabama A&M University,, Normal, AL, 35762-1447, United States
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Abstract

This work is focused on nanoscale gold particle formation by low-energy ion irradiation in glow-discharge plasma and studying particle growth by increasing time of exposure.

SiO2+Au films on SiO2 substrates produced by ion beam assisted deposition (IBAD) were exposed to ion irradiation at 1.2 keV energy for 1-2 hours. Plasmon resonance appearance caused by nanoparticle formation was observed by Optical Absorption Spectrometry (OAS).

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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