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Fabrication of III-V Semiconductor Quantum Dots in Porous Glass.

Published online by Cambridge University Press:  26 February 2011

John C. Luong  and
Nicholas F. Borrelli
John C. Luong
Affiliation:
Corning Glass Works, RD & E Laboratories, Corning, N.Y. 14831.
Nicholas F. Borrelli
Affiliation:
Corning Glass Works, RD & E Laboratories, Corning, N.Y. 14831.
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Abstract

Spatially quantized systems of III–V compounds have, in recent years, attracted considerable theoretical interest. However, the fabrication of quantum dots, a three-dimensionally quantum-confined microstructure, is particularly cumbersome and requires sophisticated lateral patterning techniques. A method, reported recently, which utilizes the microporosity of Vycor brand porous glass to produce quantum-confined microcrystals of II–VI and IV–VI semiconductors, is now extended to the fabrication of III–V quantum dots, by incorporating a microwave plasma assisted MOCVD technique. In this process, organometallic precursors impregnated in porous glass can be effectively cracked to deposit III–V microcrystals in glass. The results are discussed in light of the quantum size effect manifested by the optical absorption and photoluminescence data.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 144: Symposium W – Advances in Materials, Processing and Devices in III-V Compound Semiconductors , 1988 , 695
Copyright
Copyright © Materials Research Society 1989

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