Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-05T12:06:02.193Z Has data issue: false hasContentIssue false
  • English
  • Français

Fabrication of Diamond and Diamond-Like Carbon by Low Pressure Inductively Coupled Plasma CVD

Published online by Cambridge University Press:  15 February 2011

Katsuyuki Okada ,
Shojiro Komatsu ,
Takamasa Ishigaki  and
Seiichiro Matsumoto
Katsuyuki Okada
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Shojiro Komatsu
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Takamasa Ishigaki
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Seiichiro Matsumoto
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Get access

Abstract

A 13.56 MHz inductively coupled plasma(ICP) system has been applied to fabricate diamond and diamond-like carbon from a CH4/H2/Ar plasma. The characterizations of the obtained deposits by transmission electron diffraction, reflection high energy electron diffraction, and Raman scattering revealed that the deposits are diamond crystallites, with crystal sizes ∼1μm, and that they partially include disordered microcrystalline graphite. Although contamination due to etching of the quartz tube exists, this was drastically suppressed by the electrostatic shield(Faraday shield).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 157
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hopwood, J., Plasma Sources Sci. Technol. 1, 109(1992).Google Scholar
2. Amorim, J., Maciel, H.S., and Sudano, J.P., J. Vac. Sci. Technol. B9, 362(1991).Google Scholar
3. Komatsu, S., Moriyoshi, Y., Kasamatsu, M., and Yamada, K., J. Appl. Phys. 70, 7078(1991).Google Scholar
4. Hikosaka, Y., Nakamura, M., and Sugai, H., Jpn. J. Appl. Phys. 33, 2157(1994).Google Scholar
5. Tuinstra, F. and Koenig, J.L., J. Chem. Phys. 53, 1126(1970).Google Scholar
6. Shroder, R.E. and Nemanich, R.J., Phys. Rev. B41, 3738(1990).Google Scholar