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Fabrication of Device-Quality Wide-Gap a-Si:H Films at Very Low Substrate Temperatures

Published online by Cambridge University Press:  25 February 2011

Yoshihiro Hishikawa ,
Sadaji Tsuge ,
Noboru Nakamura ,
Shinya Tsuda ,
Shoichi Nakano ,
Michitoshi Ohnishi  and
Yukinori Kuwano
Yoshihiro Hishikawa
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Sadaji Tsuge
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Noboru Nakamura
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Shinya Tsuda
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Shoichi Nakano
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Michitoshi Ohnishi
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
Yukinori Kuwano
Affiliation:
Functional Materials Research Center, SANYO Electric Co., Ltd. 1–18–13, Hashiridani, Hirakata, Osaka 573, Japan
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Abstract

Wide-gap a-Si:H films with device quality (Tauc’s optical gap > 1.9eV, σph under AMI.5, 100mW/cm2 illumination ≥ 10−5, Ω−1cm−1, a σph/σ a≥106) have been fabricated. These films are deposited at low substrtate temperatures (TS≤80°C ) either by diluting SiH4 with H2 or optimizing the plasma parameters in a capacitively–coupled RF plasma–CVD reactor. Reduction in the SiH2 bond density and the ESR spin density are also observed. In this study, good film quality is always accompanied by a small deposition rate. Furthermore, σph is nearly the same if the deposition rate and Ts is the same, regardless of other deposition parameters. This suggests that the surface reactions or structural relaxations at the film-growing surface can produce high–quality a–Si:H films even at low TsS, if the deposition rate is low. Results in thermal annealing, light exposure, and solar cell performance confirm that these films have device quality and wide bandgap.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 192: Symposium O – Amorphous Silicon Technology - 1990 , 1990 , 511
Copyright
Copyright © Materials Research Society 1990

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References

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