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Fabrication of 10-nm Gratings Using STM Chemical Vapor Deposition

Published online by Cambridge University Press:  15 February 2011

A. Archer ,
J. M. Hetrick  and
M.H Nayfeh
A. Archer
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL, USA
J. M. Hetrick
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL, USA
M.H Nayfeh
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL, USA
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Abstract

Using STM assisted chemical vapor deposition (STM-CVD), we have successfully fabricated what we believe are the finest gratings to date. Our best grating consists of half-micron long evenly spaced lines which have a width of 10 nm and a 10 nm interspacing. The gratings were fabricated on passivated p-type silicon <111> using trimethylaluminum (TMA) as a precursor gas. Although the composition of the nanostructures is not exactly known at this time, we believe that the lines are partially metallic. We made some systematic investigations to optimize the resolution, including studies of the effect of tunneling current, tip speed, tip-sample biasing voltage, and the effect of formation of very fine TMA whiskers on the tip.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 649
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Ishizaka, A. and Shiraki, Y., J. Electrochem. Soc. 133, 666 (1986).Google Scholar
2.Kent, A., Shaw, T.M., von Molnar, S., and Awschalom, D.D., Science 262, 1249 (1993).Google Scholar
3.McCord, M.H., Kern, D.P., and Chang, T.H.P., J. Vac. Sci. Technol. B 6, 1877 (1988).Google Scholar
4.Ehrichs, E.E., Smith, W.F., and deLozanne, A.L., Ultramicroscopy 42–44, 1438 (1992).Google Scholar
5.Rubel, S., Trochei, M., Ehrichs, E.E, Smith, W.F., and deLozanne, A.L., J. Vac. Sci. Technol. B12, 1894 (1994).Google Scholar