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Fabrication and Evaluation of Transmissive Multilayer Optics for 8keVX Rays

Published online by Cambridge University Press:  25 February 2011

R. M. Bionta ,
A. F. Jankowski  and
D. M. Makowiecki
R. M. Bionta
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 5503, M.S. L-278, Livermore, CA 94550.
A. F. Jankowski
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 5503, M.S. L-278, Livermore, CA 94550.
D. M. Makowiecki
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 5503, M.S. L-278, Livermore, CA 94550.
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Abstract

We have made and tested several sliced multilayer structures which can function as transmissive x-ray optical elements (diffraction gratings, zone plates, and phase gratings) at 8 keV. Our automated multilayer sputtering system is optimized to sputter layers of arbitrary thickness for very large total deposits at high deposition rates. Diffraction patterns produced by the multilayer devices closely match theoretical predictions. Such transmissive optics have the potential for wide application in high resolution microscope and spectrometer systems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 103 , 1987 , 257
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

1.Soret, J.L.. Arch. Sci. Phys. Nat. 52. 320 (1875).Google Scholar
2.Baez, A.V.. J. Opt. Soc. Am. 42, 756 (1952): 51, 405 (1961).Google Scholar
3.Schmahl, G. and Rudolph, D., Optik 29, 577 (1969).Google Scholar
4.Kirz, J.. Opt, J.. Soc. Am. 64, 301 (1974).Google Scholar
5.Ceglio, N.M., Hawryluk, A.M.. and Schattenburg, M.. Vac, J.. Sci. Technol. 1. 1285 (1983).Google Scholar
6.Tatchyn, R., in X-Ray Microscopy (Springer. Berlin, 1984) 40.Google Scholar
7.Bionta, R.M., Appl. Phys. Lett., 51. 725. (1987).Google Scholar
8.Bionta, R.M.. Jankowski, A.F., and Makowiecki, D.M.. in X-Ray Microscopy, Springer-Berlin. 1988.Google Scholar
9.DuMond, J. and Youtz, J.P., Appl, J.. Phys. 11., 357 (1940).Google Scholar
10.Dinklage, J., Appl, J.. Phys. 38, 3781 (1967).Google Scholar
11.Spiller, E.. Appl, Phys. Lett. 20. 365 (1972): Appl. Opt. 15, 2333 (1976).Google Scholar
12.Underwood, J.H., Barbee, T.W., and Keith, D.C.. Proc. Soc. Photo-Opt. Instrum. Eng. 184. 123 (1979).Google Scholar
13.Thornton, J.A.. Ann. Rev. Mater. Sci. 7. 239 (1977).Google Scholar