Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-20T00:25:26.905Z Has data issue: false hasContentIssue false

Fabrication and characterization of UV Schottky detectors by using a freestanding GaN substrate

Published online by Cambridge University Press:  01 February 2011

Yasuhiro Shibata
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Atsushi Motogaito
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Hideto Miyake
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Kazumasa Hiramatsu
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Youichiro Ohuchi
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Hiroaki Okagawa
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Kazuyuki Tadatomo
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Tatsuya Nomura
Affiliation:
Nikon Corporation, Precision Equipment Company, 1–10–1 Asamizodai, Sagamihara, Kanagawa 228–0828, Japan
Yutaka Hamamura
Affiliation:
Nikon Corporation, Precision Equipment Company, 1–10–1 Asamizodai, Sagamihara, Kanagawa 228–0828, Japan
Kazutoshi Fukui
Affiliation:
Research Center for Development of Far-Infrared Region, Fukui University, 3–9–1 Bunkyo, Fukui, Fukui 910–8507, Japan
Get access

Abstract

GaN ultraviolet (UV) detectors were fabricated on a freestanding GaN substrate with low dislocation density. The resulting dark current density was below 1 nA/cm-2 at -8 V reverse bias, which was about 3 orders of magnitude lower than that of a similar detector made on a sapphire substrate. Moreover, the ideality factor was nearer to unity than the device on a sapphire substrate. In addition, by comparing the GaN-based device to a commonly used Si photodetector, we found that the GaN device had a lower signal-to-noise ratio and greater temperature stability. Therefore, we found a drastic reduction of dark current by using GaN freestanding substrates and so the GaN substrate produced a more effective detector than the sapphire substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Khan, M. A., Kuznia, J. N., Olson, D. T., Van Hove, J. M., Blasingame, M. and reitz, L. F.: Appl. Phys. Lett. 60, 2917 (1992).Google Scholar
2. Khan, M. A., Kuznia, J. N., Olson, D. T., Blasingame, M. and Bhattarai, A. R.: Appl. Phys. Lett. 63, 2455 (1993).Google Scholar
3. Chen, Q., Yang, J. W., Oninsky, A., Gangopadhay, S., Lim, B., Anwar, M. Z., Kahn, M. A., Kuksenkov, D. and Temkin, H.: Appl. Phys. Lett. 70, 2277 (1997).Google Scholar
4. Monroy, E., Calle, F., Munoz, E., Beaumont, B., Omnès, F. and Gibart, P.: Phys. Stat. Sol. (a) 176, 141 (1999).Google Scholar
5. Motogaito, A., Yamaguchi, M., Hiramatsu, K., Kotoh, M., Ohuchi, Y., Tadatomo, K., Hamamura, Y. and Fukui, K.: Jpn. J. Appl. Phys. 40, L368 (2001).Google Scholar
6. Motogaito, A., Ohta, K., Hiramatsu, K., Ohuchi, Y., Tadatomo, K., Hamamura, Y. and Fukui, K.: Phys. Stat. Sol. (a) 188, 337 (2001).Google Scholar
7. Miyake, H., Yasukawa, H., Kida, Y., Ohta, K., Shibata, Y., Motogaito, A., Hiramatsu, K., Ohuchi, Y., Tadatomo, K., Hamamura, Y., and Fukui, K.: Phys. Stat. Sol. (a) 200, 151 (2003)Google Scholar
8. Motogaito, A., Watanabe, H., Hiramatsu, K., Fukui, K., Hamamura, Y. and Tadatomo, K.: Phys. Stat. Sol. (a) 200, 147 (2003).Google Scholar
9. Carrano, J. C., Li, T., Grudowski, P. A., Eiting, C. J., Dupuis, R. D. and Campbell, J. C.: J. Appl. Phys. 83, 6148 (1998).Google Scholar
10. Walker, D., Saxler, A., Kung, P., Zhang, X., Hamilton, M., Diaz, J. and Razeghi, M.: Appl. Phys. Lett. 72, 3303 (1998).Google Scholar
11. Gullikson, E. M., Korbe, R., Canfield, L. R., and Vest, R. E., J. Electron. Spectrosc. Relat. Phenom. 80, 313 (1996).Google Scholar