Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-25T15:12:33.701Z Has data issue: false hasContentIssue false

Exploring simulation methods for self-healing oxide films

Published online by Cambridge University Press:  26 February 2011

Ivan Lazic
Affiliation:
[email protected], Delft University of Technology, Materials Science and Engineering, Mekelweg 2, Delft, 2628 CD, Netherlands, +31 15 2789518, +31 15 2786730
Barend Thijsse
Affiliation:
[email protected], Delft University of Technology, Materials Science and Engineering, Mekelweg 2, Delft, 2628 CD, Netherlands
Get access

Abstract

New methods for modeling oxide film growth using MD (molecular dynamics) simulations are explored in order to study the atomic mechanism of the self-healing oxidation phenomenon in metal/oxide systems. A modified MEAM (modified embedded atom method) potential is proposed and extended by a variable charge ionic potential model from the literature, for which the PPPM (particle-particle-particle-mesh) was used as Coulomb solver. In this work the first results are reported. The ionic potential model is tested in combination with the PPPM solver. The results are excellent.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Baskes, M. I., Phys. Rev. B46, 2727 (1992).Google Scholar
2. Baskes, M. I., Modified Embedded Atom Method Calculations of interfaces, Sandia National Laboratories Livermore, CA 94551–0969, Edited by Nishijuna, S. and Ondera, H., (1996).Google Scholar
3. Campbell, T., Kalia, R.K., Nakano, A., Vashishta, P., Ogata, S., and Rodgers, S., Phys. Rev. Lett. 82, 4866 (1999).Google Scholar
4. Zhou, X. W., Wadley, H. N. G., Filhol, J. S., Neurock, M.N., Phys. Rev. B69, 035402 (2004).Google Scholar
5. Hockney, R. W., Eastwood, J. W., Computer Simulation Using Particles, (McGraw-Hill, New York, 1981).Google Scholar
6. Fletcher, R. and Reeves, C. M., Computer J. (UK) 7, 149 (1964).10.1093/comjnl/7.2.149Google Scholar
7. Timonova, M., Lazic, I., and Thijsse, B.J., to be published.Google Scholar
8. Press, W. H., Teukolsky, S. A., Vetterling, W. T. and Flannery, B. P., Numerical Recipes, Chapter 10, Cambridge University Press, 2nd edition, (1992).Google Scholar