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Exploration of the Ultimate Patterning Potential Achievable with Focused Ion Beams

Published online by Cambridge University Press:  01 February 2011

Jacques Gierak ,
Eric Bourhis ,
Dominique Mailly ,
Gilles Patriarche ,
Ali Madouri ,
Ralf Jede ,
Sven Bauerdick ,
lars bruchhaus ,
Peter Hawkes  and
Anne-Laure Biance
...Show all authors
Jacques Gierak
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France, 33 (0)1 69 63 60 75
Eric Bourhis
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Dominique Mailly
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Gilles Patriarche
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Ali Madouri
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Ralf Jede
Affiliation:
[email protected], Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
Sven Bauerdick
Affiliation:
[email protected], Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
lars bruchhaus
Affiliation:
[email protected], Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
Peter Hawkes
Affiliation:
[email protected], CEMES/CNRS, 29 rue Jeanne Marvig, Toulouse, 31055, France
Anne-Laure Biance
Affiliation:
[email protected], Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Birgitta Schiedt
Affiliation:
[email protected], Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Loïc Auvray
Affiliation:
[email protected], Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Laurent Bardotti
Affiliation:
[email protected], UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Brigitte Prevel
Affiliation:
[email protected], UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Pascal Mélinon
Affiliation:
[email protected], UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Alain Perez
Affiliation:
[email protected], UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Jacques Ferré
Affiliation:
[email protected], UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Jean Pierre Jamet
Affiliation:
[email protected], UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Alexandra Mougin
Affiliation:
[email protected], UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Claude Chappert
Affiliation:
[email protected], Université Paris-Sud, IEF, Bât 220, Orsay, 91405, France
Véronique Mathet
Affiliation:
[email protected]. -psud.fr, Université Paris-Sud, IEF, Bât 220, Orsay, 91405, France
Lionel Aigouy
Affiliation:
[email protected], CNRS UPR 5, ESPCI, 10 rue Vauquelin, Paris, 75231, France
Isabelle Robert-Philip
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Isabelle Sagnes
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Rémy Braive
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Alexios Beveratos
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Izo Abram
Affiliation:
[email protected], CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
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Abstract

Decisive advances in the fields of nanosciences and nanotechnologies are intimately related to the development of new instruments and of related writing schemes and methodologies. Therefore we have recently proposed exploitation of the nano-structuring potential of a highly Focused Ion Beam as a tool, to overcome intrinsic limitations of current nano-fabrication techniques and to allow innovative patterning schemes urgently needed in many nanoscience challenges. In this work, we will first detail a very high resolution FIB instrument we have developed specifically to meet these nano-fabrication requirements. Then we will introduce and illustrate some advanced FIB processing schemes. These patterning schemes are (i) Ultra thin membranes as an ideal template for FIB nanoprocessing. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of graphite substrates to prepare 2D-organized arrays of clusters. (iv) FIB engineering of the optical properties of microcavities.

Keywords

ion-beam processinglithography (removal)nanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1089: Symposium Y – Focused Ion Beams for Materials Characterization and Micromachining , 2008 , 1089-Y03-01
Copyright
Copyright © Materials Research Society 2008

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