Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-17T16:52:04.245Z Has data issue: false hasContentIssue false

Examination of Ion Beam-Target Angle Effects by Optical Spectroscopic Profiling

Published online by Cambridge University Press:  28 February 2011

J. D. Klein
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062
Get access

Abstract

The optical emission spectra resulting from ion beam sputtering a SrTiO3 target were observed as a function of position. A collimated optical fiber bundle parallel to the plane of die sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. Three different angles of incidence of the beam to die target were examined for evidence of bombardment of candidate substrate positions by undesirable species. When the ion beam was at normal incidence to the target or 22.5* from normal incidence the Ar and O contours were of similar shape. However, when die target was inclined at an angle of 45* to die incident ion beam die O contours deviated markedly. Under these conditions it appears that there is a substantial oxygen flux in a direction normal to die target surface. Under these conditions die placement of a substrate facing die sputter target would probably result in undesirable bombardment of die growing film by energetic oxygen.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Li, P. and Lu, T.-M., Appl. Phys. Lett 57, 2336 (1990).CrossRefGoogle Scholar
2. Klein, J.D., Yen, A., and Clauson, S.L., Appl. Phys. Lett. 56, 394 (1990).CrossRefGoogle Scholar
3. Klein, J.D., Yen, A., and Clauson, S.L., J. Appl. Phys. 67, 6389 (1990).CrossRefGoogle Scholar
4. Matsuda, Y., Yamamura, Y., Ueda, Y., Uchino, K., Muraoka, K., Maeda, M., and Akazaki, M., Jpn. J. Appl. Phys. 25, 8 (1986).CrossRefGoogle Scholar
5. Haring, R.A., Pedrys, R., Haring, A., and De Vries, A.E., Nucl. Instr. & Meth. B 4, 40 (1984).CrossRefGoogle Scholar
6. Brauer, G., Hasselkamp, D., Kruger, W., and Scharmann, A., Nucl. Instr. & Meth. B 12. 458 (1985).CrossRefGoogle Scholar
7. Klein, J.D. and Yen, A., J. Appl. Phys., 70, 505 (1991).CrossRefGoogle Scholar
8. Klein, J.D. and Yen, A., J. Vac. Sci. Technol. A, 9, 2791 (1991).CrossRefGoogle Scholar
9. Alan Krauss, R., private communication (1991).Google Scholar