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Evolution of Surface Roughness During CVD Growth
Published online by Cambridge University Press: 15 February 2011
Abstract
Monte Carlo simulations of physical and chemical vapor deposition are used to study roughening kinetics of films that grow by nucleation and coalescence of clusters. The effects of interlayer transport, preferential dissociation of molecular precursors and energetic differences between the clusters and the substrate are examined.
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- Copyright © Materials Research Society 1997
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