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Evolution of Roughness on InP Layers Observed by Scanning Force Microscopy

Published online by Cambridge University Press:  15 February 2011

M. A Cotta ,
R. A Hamm ,
S. N. G Chu ,
T. W Staley ,
L. R Harriott ,
M. B Panish  and
H. Temkin
M. A Cotta
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
R. A Hamm
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
S. N. G Chu
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
T. W Staley
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974 Materials Science Program, University of Wisconsin-Madison, Madison, WI53706
L. R Harriott
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
M. B Panish
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
H. Temkin
Affiliation:
Electrical Engineering Dept., Colorado State University, Fort Collins, CO 80523
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Abstract

The evolution of surface roughness with increasing thickness of (100) InP layersgrown by metalorganic molecular beam epitaxy has been observed by scanningforce microscopy. The process of roughening gives rise to periodic elongatedfeatures on the surface aligned in the [011] direction, reflecting the surfaceanisotropy. The morphology eventually evolves to a grain-like surface. Theroughening is dependent on both the group III and V flux, and the growthtemperature, indicating that this phenomenon is kinetically controlled by surfacediffusion activation. For each set of parameters chosen for the growth, there is aminimum temperature where smooth, two-dimensional growth can be obtained.Below that temperature the roughening shows two distinct power law regimesdependent on the epitaxial layer thickness.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 312: Symposium P – Common Themes and Mechanisms of Epitaxial Growth , 1993 , 23
Copyright
Copyright © Materials Research Society 1993

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References

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