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Evolution of Mesas on Si(111) Surface Under Sublimation: Nanofabrication through the Control of Atomic Steps

Published online by Cambridge University Press:  01 February 2011

Kee-Chul Chang  and
Jack M. Blakely
Kee-Chul Chang
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14850
Jack M. Blakely
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14850
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Abstract

How the surface morphology of a low index crystal surface evolves under annealing below the roughening temperature is still being investigated both theoretically and experimentally. This research is needed to understand the stability of nanostructures and for the control of step array on surfaces for various technological applications.

We have approached this problem from an experimental point of view by looking at the step morphology on the top of mesas patterned on Si(111) after flashing at 1200°C and annealing between 1000–1100°C. We find that after annealing, nanometer height ridges develop on the edges of the mesas except for one edge which becomes a source for steps advancing into the mesa top. The edge that does not develop a ridge is mainly determined by the initial miscut of the surface.

We attempt to explain our results through step dynamics and present some applications of this phenomena in creating novel arrays of steps.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 782: Symposium A – Micro- and Nanosystems , 2003 , A5.75
Copyright
Copyright © Materials Research Society 2004

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References

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