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Published online by Cambridge University Press: 15 February 2011
The growth process of silver deposited onto the Si(111) 7 × 7 surface at room temperature was studied with medium energy ion scattering in combination with channelling. Coverages studied were in the range 0−8 × 1015 Ag atoms cm−2. The measurements show that silver forms three-dimensional islands. Although incorporation of small amounts of silicon in the silver islands (less than 8 × 10−4 Si atoms cm−2) cannot be excluded, no evidence was found for mixing between silver and silicon or for silicide formation.