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Evaluation of Mechanical Properties of Sputtered Ceramic Films from Nanoindentation and Wafer Curvature Techniques

Published online by Cambridge University Press:  15 February 2011

Rama B. Inturi  and
John A. Barnard
Rama B. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487-0202
John A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487-0202
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Abstract

TiB2, MoSi2, Si3N4 and Ta4N ceramic films were magnetron sputtered on oxidized Si and Coming 7059 glass substrates at ambient temperature. X-ray diffraction studies indicate that the structure of the films is very different on the two substrates, even though the surface of both substrates is amorphous. The hardness and elastic modulii of the films on oxidized Si are slightly higher than those of the films deposited on Coming glass substrate, even at indentation depths where substrate effects are considered to be negligible. A substantial increase in hardness (5–10 GPa) was observed for TiB2 films, when compared to the properties of bulk stoichiometric TiB2. Stress- temperature diagrams determined from room temperature to 250 C indicate that all the films prepared in this study display a pure elastic behavior in that temperature range.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 403: Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II , 1995 , 265
Copyright
Copyright © Materials Research Society 1996

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References

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