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Equilibrium Configuration of Bi-Doped ZnO Grain Boundaries: Intergranular Amorphous Films

Published online by Cambridge University Press:  10 February 2011

Haifeng Wang
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139
Yet-Ming Chiang
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139
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Abstract

It is shown that the solid state equilibrium configuration of ZnO grain boundaries saturated with Bi-doping is a nanometer-thick amorphous film. Polycrystalline ZnO samples doped with Bi2O3 were studied using high resolution transmission electron microscopy (HRTEM) and dedicated scanning transmission electron microscopy (STEM). Samples were equilibrated below the eutectic temperature (Teutectic = 740°C) and at 1 atmosphere pressure, starting from three different initial states: one was cooled from above the eutectic temperature; a second was processed entirely below the eutectic temperature; and the third was de-segregated by applying high pressure (1 GPa) followed by annealing at 1 atmospheric pressure. In all instances, ZnO grain boundaries contain an amorphous film 1.0–1.3 ran in thickness, corresponding to a Bi excess equivalent to approximately one monolayer.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Levinson, L. M. and Philipp, H. R., IEEE Transactions on Parts, Hybrids and Packaging, Vol. PHP–13, 338, 1977.Google Scholar
2. Gupta, T. K., J. Am. Ceram. Soc., 73 (7) 1817–40, 1990.Google Scholar
3. Dey, D. and Bradt, R. C, J. Am. Ceram. Soc, 75 (9) 2529–34, 1992.Google Scholar
4. Wong, J. and Morris, W. G., Am. Ceram. Soc. Bull., 53 (11) 816, 1974.Google Scholar
5. Gambino, J. P., Kingery, W. D., Pike, G. E. and Philipp, H. P., J. Am. Ceram. Soc, 72 (4) 642–45, 1989.Google Scholar
6. Lee, J.- R. and Chiang, Y.-M., Solid State Ionics, 75, 7988, 1995.Google Scholar
7. Wong, J., J. Am. Ceram. Soc, 57 (8) 357, 1974.Google Scholar
8. Kingery, W. D., Vander Sande, J. B. and Mitamura, T., J. Am. Ceram, Soc, 62 (3–4) 221–22, 1979.Google Scholar
9. Clarke, D. R., J. Appl. Phys., 49 (4) 2407, 1978.Google Scholar
10. Olsson, E., Falk, L. K. L. and Dunlop, G. L., J. Mater. Sci., 20 (11) 4091–98, 1985.Google Scholar
11. Olsson, E. and Dunlop, G. L., J. Appl. Phys., 66 (8) 3666–75, 1989.Google Scholar
12. Lee, J.-R., Ph. D. Thesis, Massachusetts Institute of Technology, 1995.Google Scholar
13. Lee, J.-R., Chiang, Y.-M. and Ceder, G., Acta Metall., in press, 1996.Google Scholar
14. Laufand, R. J. Bond, W. D., Ceram. Bull., 63 (2) 278–81, 1984.Google Scholar
15. Ikeda, J. A. S., Chiang, Y.-M., Garratt-Reed, A. J. and Vander Sande, J. B., J. Am. Ceram Soc, 76 (10) 2447–59, 1993.Google Scholar
16. Ackler, H. D. and Chiang, Y.-M., to appear in Ceramic Microstructures ‘96, edited by Tomsia, A. P and Glaeser, A. M., 1996.Google Scholar
17. Chiang, Y.-M., Silverman, L. A., French, R. H. and Cannon, R. M., J. Am. Ceram. Soc., 7 (5) 143–52, 1994.Google Scholar
18. Kleebe, H.-J., Cinibulk, M. K., Cannon, R. M. and Ruehle, M., J. Am. Ceram. Soc, 76 (8 1969–77, 1993.Google Scholar
19. Clarke, D. R., J. Am. Ceram. Soc., 70 (1) 1522, 1987.Google Scholar