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Epitaxial Silicides: a Summary of Recent Developments

Published online by Cambridge University Press:  26 February 2011

R. T. Tung  and
F. Schrey
R. T. Tung
Affiliation:
At&t Bell Laboratories, 600 Mountain Avenue, Murray Hill, N. J. 07974
F. Schrey
Affiliation:
At&t Bell Laboratories, 600 Mountain Avenue, Murray Hill, N. J. 07974
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Abstract

We will briefly describe the latest developments in the field of epitaxial silicide. Our present understanding of important issues in epitaxial silicide will be reviewed. Attention will be given to one epitaxial system, CoSi2 on Si(111), where considerable understanding of the silicide reaction has been gained recently.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 122: Symposium I – Interfacial Structure, Properties, and Design , 1988 , 559
Copyright
Copyright © Materials Research Society 1988

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References

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