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Environmental Effects on Subcritical Delamination of Dielectric and Metal Films from Organosilicate Glass (OSG) Thin Films
Published online by Cambridge University Press: 01 February 2011
Abstract
Subcritical delamination of dielectric and metal films from organosilicate glass (OSG) thin films was studied in controlled ambient with different levels of relative humidity and in aqueous environments of varying pH. The material systems studied include OSG/SiO2, OSG/TaN and OSG/SiNx. For both sets of experiments, subcritical crack growth in OSG is found to be described by a model originally developed for soda-lime silicate glass. The threshold energy release rate for water molecule-assisted cracking varies linearly with the natural logarithm of water partial pressure. In aqueous environments, the threshold value decreases linearly with increasing pH in accordance with a simple model. The slope of crack growth rate curve also decreases with increasing pH.
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- Copyright © Materials Research Society 2003
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