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Enhancement of Thin-Film Adhesion by MeV-ION and keV Electron Bombardment

Published online by Cambridge University Press:  21 February 2011

T. A. Tombrello
T. A. Tombrello*
Affiliation:
Schlumberger-Doll Research, Old Quarry Road, Ridgefield, CT 06877–4108
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Abstract

Since the discovery in 1981 that the electronic excitation produced by MeV ions can enhance thin film adhesion to a substrate, there have been many investigations to determine the origin of the effect and to apply it to problems of technological interest. As we approach the seventh anniversary of its discovery, I shall use this opportunity to review our progress toward these goals. In general, we have discovered that although the electronic excitation provided by the incident beam is responsible for the improvement in adhesion, it is certain that there are quite a number of separate effects involved. These have been shown to include: surface cracking of the substrate; the breakup of contaminant or oxide layers on the substrate by the beam; and the relaxation of surface strain in the substrate. The recent use of a variety of new techniques seems to offer the hope that we are beginning to make progress in untangling these phenomena.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 119: Symposium F – Adhesions in Solids , 1988 , 95
Copyright
Copyright © Materials Research Society 1988

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