Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-29T07:36:25.111Z Has data issue: false hasContentIssue false
  • English
  • Français

Enhancement in Adhesion of Pt Films on Ceramics by Helium Ion and Electron Irradiation, and a Study of their Electrochemical Behaviour.

Published online by Cambridge University Press:  25 February 2011

D.K. Sood ,
P.D. Bond  and
S.P.S. Badwal
D.K. Sood
Affiliation:
Microelectronics Technology Centre, Royal MelbourneInstitute of Technology, Melbourne 3000 Australia.
P.D. Bond
Affiliation:
Microelectronics Technology Centre, Royal MelbourneInstitute of Technology, Melbourne 3000 Australia.
S.P.S. Badwal
Affiliation:
CSIRO Division of Materials Science, Advanced Materials Laboratory, P.O. Box 4331, Melbourne 3001, (Australia)
Get access

Abstract

The adhesion of Pt films (10–330nm thick) sputter deposited on prepared substrates of yttria stabilized zirconia (YSZ) and alumina has been observed to be remarkably enhanced after irradiation with 2 MeV He++ ions and 5–30 keV electrons. The adhesion enhancement has been studied as a function ot beam energy, dose and film thickness. Thermal stability of adhesion enhancement and of the microstructure of ‘stitched’ films has been investigated. The electrochemical behaviour of ‘stitched’ Pt electrodes on YSZ has been studied by complex impedance spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 565
Copyright
Copyright © Materials Research Society 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Collins, L.E., Perkins, J.G. and Stroud, P.T., Thin Solid Films 4, 41 (1969).Google Scholar
2. Padmanabhan, K.P. and Sorensen, G., Thin Solid Films 81, 13 (1981).Google Scholar
3. Griffith, J.E., Qiu, Y. and Tombrello, T.A., Nucl. Instrum. Meth. 198, 607 (1982).Google Scholar
4. Tombrello, T.A., Nucl. Instrum. Meth. (in press).Google Scholar
5. Mendenhall, M.H., Ph.D. Thesis (Cal.Inst. of Technology, 1983).Google Scholar
6. Mitchell, I.V., Williams, J.S., Smith, P. and Elliman, R.G., Appl. Phys. Lett. (in press).Google Scholar
7. Badwal, S.P.S., J. Electroanal. Chem. (in press).Google Scholar
8. Mitchell, I.V. et al (these proceedings).Google Scholar
9. Ziegler, J.F., Helium Stopping Powers and Ranges in All Elements (Pergamon Press, New York, 1977).Google Scholar
10. Wells, O.G., Scanning Electron Microscopy (McGraw Hill, New York, 1974).Google Scholar
11. Chopra, K.L., Thin Film Phenomena (McGraw Hill, New York, 1969) p. 320.Google Scholar
12. Cole, J.S. and Cole, R.H., J. Chem. Phys. 9, 341 (1941)Google Scholar
13. Braunshtein, D., Tannhauser, D.S. and Riess, I., J. Electrochem. Soc. 128, 82 (1981).Google Scholar
14. Kleitz, M., Bernard, H., Fernandez, E. and Schouler, E. in Advances in Ceramics, Vol. 3, Heuer, A.H. and Hobbs, L.W., eds. (Am Ceramics Soc. Inc., Columbas, Ohio, 1981), p. 310.Google Scholar
15. Badwal, S.P.S., Ciacchi, F.T. and Kashmirian, A.S., Sixth Australian Electrochemistry Conf. Feb. 1984. Geelong, Australia.Google Scholar
16. Weinberg, W.H. and Merrill, R.P., Surface Sci. 39, 206 (1973).Google Scholar