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Energy Dependence of Compound Growth in Au-Al and Cu-Al Bilayer Systems During Ion Beam Mixing

Published online by Cambridge University Press:  25 February 2011

S.U. Campisano
Affiliation:
Istituto Dipartimentale Di Fisica, Università Di Catania, Corso Italia 57, 195129, Catania, Italy
Chu Techang
Affiliation:
Istituto Dipartimentale Di Fisica, Università Di Catania, Corso Italia 57, 195129, Catania, Italy
S. Cannavo '
Affiliation:
Istituto Dipartimentale Di Fisica, Università Di Catania, Corso Italia 57, 195129, Catania, Italy
E. Rimini
Affiliation:
Istituto Dipartimentale Di Fisica, Università Di Catania, Corso Italia 57, 195129, Catania, Italy
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Abstract

The kineticsof phase formation and growth in Au-Al and Cu-Al thin film bilayers under ion beam bombardment was investigated in detail for the dependence on the beam energy. The experimental data can be interpreted within the radiation enhanced diffusion description, taking into proper account the target configuration, the growth of a new phase and the deposited energy density distribution.

Type
Research Article
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

1. Mayer, J.W.,Tsaur, B.Y.,Lau, S.S. and Hung, L.S., Nucl.Instr. and Meth. 182/183,1 (1981)Google Scholar
2. Besenbacker, E.,Bøttiger, J.,Nielsen, S.K.,Whitlow, H.J., Appl.Phys. A29,141 (1982)Google Scholar
3. Campisano, S.U.,Techang, Chu,Lo Giudice, S. and Rimini, E., Nucl.Instr. and Meth. 209/210, 139 (1983)Google Scholar
4. Sigmund, P., Appl.Phys. A30 43 (1983)Google Scholar
5. Techang, Chu,Campisano, S.U. and Trovato, A., Rad.Effects Letters 76,131(1983)Google Scholar
6. Winterbon, K.B., Ion Implantation Range and Energy Deposition Distributions, Vol. 2 (Plenum Press, New York, 1975).Google Scholar