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Ellipsometry Studies of Semiconductor Surface Cleaning

Published online by Cambridge University Press:  21 February 2011

E.E. Irene  and
Y.Y. Hu
E.E. Irene
Affiliation:
Department of Chemistry, University of North Carolina Chapel Hill, North Carolina 27599-3290
Y.Y. Hu
Affiliation:
Department of Chemistry, University of North Carolina Chapel Hill, North Carolina 27599-3290
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Abstract

Ellipsometry is shown to provide a sensitive evaluation of the surface cleaning process based on in-situ and ex-situ studies of the cleaning of Si, Ge, and InP surfaces. Both single wavelength and spectroscopic ellipsometry are shown to be applicable. The essentials of the measurement and sample results are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 315: Symposium Y – Surface Chemical Cleaning and Passivation for Semiconductor Processing , 1993 , 393
Copyright
Copyright © Materials Research Society 1993

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References

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