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Ellipsometry Studies of Semiconductor Surface Cleaning
Published online by Cambridge University Press: 21 February 2011
Abstract
Ellipsometry is shown to provide a sensitive evaluation of the surface cleaning process based on in-situ and ex-situ studies of the cleaning of Si, Ge, and InP surfaces. Both single wavelength and spectroscopic ellipsometry are shown to be applicable. The essentials of the measurement and sample results are discussed.
- Type
- Research Article
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- Copyright
- Copyright © Materials Research Society 1993
References
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