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Ellipsometric Investigation of Metal-Organic Chemical Vapor Deposition of Niobium Oxide Films

Published online by Cambridge University Press:  15 February 2011

Tobias Gerfin  and
Michael Graetzel
Tobias Gerfin
Affiliation:
Institut de Chimie Physique, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
Michael Graetzel
Affiliation:
Institut de Chimie Physique, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
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Abstract

Niobium oxide films have been prepared by metal-organic chemical vapor deposition (MOCVD) in two different systems via thermal decomposition of Nb(OEt)5.A detailed study by exsitu variable-angle spectroscopic ellipsometry indicates a wavelength dependence of the refractive index that could be described by a Cauchy type dispersion formula and typical values of 1.9 to 2.1 at 632.8nm. The band gap of these films were at about 3.5 and 4eV for the indirect and direct transition. Preliminary results of in-situ ellipsometry at four different wavelengths in the visible and UV will be discusssed. The films were amorphous, extremely smooth and pinhole free and therefore they are useful candidates for interdiffusion barrier layers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 45
Copyright
Copyright © Materials Research Society 1995

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References

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