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Electronic Memory Effects in Zinc Oxide Nanoparticle -Polystyrene Devices with a Calcium Top Electrode

Published online by Cambridge University Press:  26 February 2011

Frank Verbakel
Affiliation:
[email protected], Eindhoven University of Technology, Molecular Materials and Nanosystems, P.O. Box 513, Eindhoven, 5600 MB, Netherlands, +31402475783
Stefan C. J. Meskers
Affiliation:
[email protected], Eindhoven University of Technology, Molecular Materials and Nanosystems, P.O. Box 513, Eindhoven, 5600 MB, Netherlands
René A. J. Janssen
Affiliation:
[email protected], Eindhoven University of Technology, Molecular Materials and Nanosystems, P.O. Box 513, Eindhoven, 5600 MB, Netherlands
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Abstract

Diodes with an active layer of solution processed zinc oxide (ZnO) nanoparticles and polystyrene are studied. Poly(3,4-ethylenedioxythiophene)- polystyrenesulfonate (PEDOT:PSS) on indium doped tin oxide (ITO) is used as the bottom electrode and aluminum or calcium are used as top electrode. Pristine devices show diode behavior in their current-voltage characteristics. The conductivity of the device in reverse bias can be raised three orders of magnitude by applying a positive voltage or by illumination with UV light. In this high conductivity state we observe reversible electronic memory effects. The electronic memory effects are attributed to a reversible electrochemical process at the PEDOT:PSS/ZnO interface. Memory effects in diodes with Al and Ca metal electrode are found to be very similar, consistent with the view that the memory effects arise at the PEDOT:PSS/ZnO interface.

Keywords

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Yang, Y., Ma, L., and Wu, J., MRS Bulletin 29, 833 (2004)Google Scholar
2. Scott, J. C., Science 304, 62 (2004)Google Scholar
3. Yang, Y., Ouyang, J., Ma, L., Tseng, R. J.-H., and Chu, C.-W., Adv. Func. Mater. 16, 1001 (2006)Google Scholar
4. Bozano, L. D., Kean, B. W., Beinhoff, M., Carter, K. R., Rice, P. M., and Scott, J. C., Adv. Func. Mater. 15, 1933 (2005)Google Scholar
5. Tang, W., Shi, H. Z., Xu, G., Ong, B. S., Popovic, Z. D., Deng, J. C., Zhao, J., and Rao, G. H., Adv. Mater. 17, 2307 (2005)Google Scholar
6. Mohanta, K., Majee, S. K., Batabyal, S. K., and Pal, A. J., J. Phys. Chem. B 110, 18231 (2006)Google Scholar
7. Prakash, A., Ouyang, J., Lin, J.-L., and Yang, Y., J. Appl. Phys. 100, 054309 (2006)Google Scholar
8. Verbakel, F., Meskers, S. C. J., and Janssen, R. A. J., Appl. Phys. Lett. 89, 102103 (2006)Google Scholar
9. Meulenkamp, E. A., J. Phys. Chem. B 10, 7831 (1999)Google Scholar
10. Tjong, S. C., Liang, G. D., and Bao, S. P., J. Appl. Polym. Sci. 102, 1436 (2006)Google Scholar
11. Pearton, S. J., Norton, D. P., Ip, K., Heo, Y. W., and Steiner, T., J. Vac. Sci. & Techn. B 22, 932 (2004)Google Scholar
12. Özgür, Ü., Alivov, Y. I., Liu, C., Teke, A., Reshchikov, M. A., Doğan, S., Avrutin, V., Cho, S.-J., and Morkoç, H., J. Appl. Phys. 98, 041301 (2005)Google Scholar
13. Takahashi, Y., Kanamori, M., Kondoh, A., Minoura, H., and Ohya, Y. J., Jpn. J. Appl. Phys., 33, 6611 (1994)Google Scholar
14. Dearnaley, G., Stoneham, A. M., and Morgan, D. V., Rep. Prog. Phys. 33, 1129 (1970)Google Scholar
15. Thurstans, R. E. and Oxley, D. P., J. Phys. D.: Appl. Phys. 35, 802 (2002)Google Scholar
16. Hada, T., Wasa, K., and Hayakawa, S., Jpn. J. Appl. Phys. 10, 521 (1971)Google Scholar
17. Hunter, O. Jr and Schaefer, J. A., US Patent 4472296 (1984)Google Scholar
18. Cölle, M., Büchel, M., and Leeuw, D. M. de, Org. Electr. 7, 305 (2006)Google Scholar
19. Campbell, I. H., Hagler, T. W., Smith, D. L., and Ferraris, J. P. Phys. Rev. Lett. 76, 1900 (1996)Google Scholar
20. Smits, J. H. A., Meskers, S. C. J., Janssen, R. A. J., Marsman, A. W., and Leeuw, D. M. de, Adv. Mater. 17, 1169 (2005)Google Scholar
21. Liu, J., Gao, P., Mai, W., Lao, C., and Wang, Z. L., and Tummala, R., Appl. Phys. Lett. 89, 063125 (2006)Google Scholar
22. Oba, F., Nishitani, S. R., Isotani, S., Adachi, H., and Tanaka, I., J. Appl. Phys. 90, 824 (2001)Google Scholar
23. Van de Walle, C. G., Phys Rev. Lett. 85, 1012 (2000)Google Scholar