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Electron Optical Characterization of Amorphous SIC:H CVD Films

Published online by Cambridge University Press:  25 February 2011

R. M. Fisher ,
J. B. Posthill ,
M. Sarikaya ,
J. A. Reimer  and
M. Petrich
R. M. Fisher
Affiliation:
Center For Advanced Materials, Lawrence Berkeley Lab., Univ. of Cal.
J. B. Posthill
Affiliation:
National Center for Electron Microscopy, LBL, Univ. of California
M. Sarikaya
Affiliation:
Univ. of Washington, Seattle, WA 98195
M. Petrich
Affiliation:
Dept. of Chem. Eng., Univ. of California, Berkeley Ca., 94720.
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Abstract

The utility of various electron optical methods to characterize the microstructure and composition of thin films of amorphous silicon-carbon films formed by plasma-activated CVD of SiH4 and CH4 has been investigated. The techniques employed include conventional and high resolution transmission electron microscopy and diffraction, non-dispersive x-ray spectroscopy and electron energy loss spectroscopy.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 69: Symposium D – Materials Characterization , 1986 , 153
Copyright
Copyright © Materials Research Society 1986

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References

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